Influence of reactor walls on plasma chemistry and on silicon etch product densities during silicon etching processes in halogen-based plasmas

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Published in:Plasma sources science & technology 2004-08, Vol.13 (3), p.522-530
Main Authors: Cunge, G, Kogelschatz, M, Sadeghi, N
Format: Article
Language:English
Subjects:
Exact sciences and technology
Physics
Physics of gases, plasmas and electric discharges
Physics of plasmas and electric discharges
Plasma applications
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subjects Exact sciences and technology
Physics
Physics of gases, plasmas and electric discharges
Physics of plasmas and electric discharges
Plasma applications
title Influence of reactor walls on plasma chemistry and on silicon etch product densities during silicon etching processes in halogen-based plasmas
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