Loading…
Degradation dynamics, recovery, and characterization of negative bias temperature instability: Negative-Bias-Temperature Instability (NBTI) in MOS devices special sectio n
Saved in:
Published in: | Microelectronics and reliability 2005, Vol.45 (1), p.99-105 |
---|---|
Main Authors: | , , , , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Online Access: | Get full text |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
cited_by | |
---|---|
cites | |
container_end_page | 105 |
container_issue | 1 |
container_start_page | 99 |
container_title | Microelectronics and reliability |
container_volume | 45 |
creator | ERSHOV, M SAXENA, S MINEHANE, S CLIFTON, P REDFORD, M LINDLEY, R KARBASI, H GRAVES, S WINTERS, S |
description | |
format | article |
fullrecord | <record><control><sourceid>pascalfrancis</sourceid><recordid>TN_cdi_pascalfrancis_primary_16404643</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>16404643</sourcerecordid><originalsourceid>FETCH-pascalfrancis_primary_164046433</originalsourceid><addsrcrecordid>eNqNyksOgjAQgOEuNBEfd-jGHSQFGjiAj3gAt4YMZcAxUMi0ktTTa6IHcPX_i28hIqWyIsnKVK_E2rmHUqpUaRqJ2xE7hgY8jVY2wcJAxsWS0Ywzcogl2EaaOzAYj0yvLxxbabH7_IyyJnDS4zAhg38ySrLOQ009-bAVyxZ6h7tfN2J_Pl0Pl2QCZ6BvGawhV01MA3Co0kIrXeg8_9e9ASdERi8</addsrcrecordid><sourcetype>Index Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Degradation dynamics, recovery, and characterization of negative bias temperature instability: Negative-Bias-Temperature Instability (NBTI) in MOS devices special sectio n</title><source>ScienceDirect Freedom Collection</source><creator>ERSHOV, M ; SAXENA, S ; MINEHANE, S ; CLIFTON, P ; REDFORD, M ; LINDLEY, R ; KARBASI, H ; GRAVES, S ; WINTERS, S</creator><creatorcontrib>ERSHOV, M ; SAXENA, S ; MINEHANE, S ; CLIFTON, P ; REDFORD, M ; LINDLEY, R ; KARBASI, H ; GRAVES, S ; WINTERS, S</creatorcontrib><identifier>ISSN: 0026-2714</identifier><identifier>CODEN: MCRLAS</identifier><language>eng</language><publisher>Oxford: Elsevier</publisher><subject>Applied sciences ; Electronics ; Exact sciences and technology ; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices ; Transistors</subject><ispartof>Microelectronics and reliability, 2005, Vol.45 (1), p.99-105</ispartof><rights>2005 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,777,781,4010</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=16404643$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>ERSHOV, M</creatorcontrib><creatorcontrib>SAXENA, S</creatorcontrib><creatorcontrib>MINEHANE, S</creatorcontrib><creatorcontrib>CLIFTON, P</creatorcontrib><creatorcontrib>REDFORD, M</creatorcontrib><creatorcontrib>LINDLEY, R</creatorcontrib><creatorcontrib>KARBASI, H</creatorcontrib><creatorcontrib>GRAVES, S</creatorcontrib><creatorcontrib>WINTERS, S</creatorcontrib><title>Degradation dynamics, recovery, and characterization of negative bias temperature instability: Negative-Bias-Temperature Instability (NBTI) in MOS devices special sectio n</title><title>Microelectronics and reliability</title><subject>Applied sciences</subject><subject>Electronics</subject><subject>Exact sciences and technology</subject><subject>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</subject><subject>Transistors</subject><issn>0026-2714</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2005</creationdate><recordtype>article</recordtype><recordid>eNqNyksOgjAQgOEuNBEfd-jGHSQFGjiAj3gAt4YMZcAxUMi0ktTTa6IHcPX_i28hIqWyIsnKVK_E2rmHUqpUaRqJ2xE7hgY8jVY2wcJAxsWS0Ywzcogl2EaaOzAYj0yvLxxbabH7_IyyJnDS4zAhg38ySrLOQ009-bAVyxZ6h7tfN2J_Pl0Pl2QCZ6BvGawhV01MA3Co0kIrXeg8_9e9ASdERi8</recordid><startdate>2005</startdate><enddate>2005</enddate><creator>ERSHOV, M</creator><creator>SAXENA, S</creator><creator>MINEHANE, S</creator><creator>CLIFTON, P</creator><creator>REDFORD, M</creator><creator>LINDLEY, R</creator><creator>KARBASI, H</creator><creator>GRAVES, S</creator><creator>WINTERS, S</creator><general>Elsevier</general><scope>IQODW</scope></search><sort><creationdate>2005</creationdate><title>Degradation dynamics, recovery, and characterization of negative bias temperature instability</title><author>ERSHOV, M ; SAXENA, S ; MINEHANE, S ; CLIFTON, P ; REDFORD, M ; LINDLEY, R ; KARBASI, H ; GRAVES, S ; WINTERS, S</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-pascalfrancis_primary_164046433</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2005</creationdate><topic>Applied sciences</topic><topic>Electronics</topic><topic>Exact sciences and technology</topic><topic>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</topic><topic>Transistors</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>ERSHOV, M</creatorcontrib><creatorcontrib>SAXENA, S</creatorcontrib><creatorcontrib>MINEHANE, S</creatorcontrib><creatorcontrib>CLIFTON, P</creatorcontrib><creatorcontrib>REDFORD, M</creatorcontrib><creatorcontrib>LINDLEY, R</creatorcontrib><creatorcontrib>KARBASI, H</creatorcontrib><creatorcontrib>GRAVES, S</creatorcontrib><creatorcontrib>WINTERS, S</creatorcontrib><collection>Pascal-Francis</collection><jtitle>Microelectronics and reliability</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>ERSHOV, M</au><au>SAXENA, S</au><au>MINEHANE, S</au><au>CLIFTON, P</au><au>REDFORD, M</au><au>LINDLEY, R</au><au>KARBASI, H</au><au>GRAVES, S</au><au>WINTERS, S</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Degradation dynamics, recovery, and characterization of negative bias temperature instability: Negative-Bias-Temperature Instability (NBTI) in MOS devices special sectio n</atitle><jtitle>Microelectronics and reliability</jtitle><date>2005</date><risdate>2005</risdate><volume>45</volume><issue>1</issue><spage>99</spage><epage>105</epage><pages>99-105</pages><issn>0026-2714</issn><coden>MCRLAS</coden><cop>Oxford</cop><pub>Elsevier</pub></addata></record> |
fulltext | fulltext |
identifier | ISSN: 0026-2714 |
ispartof | Microelectronics and reliability, 2005, Vol.45 (1), p.99-105 |
issn | 0026-2714 |
language | eng |
recordid | cdi_pascalfrancis_primary_16404643 |
source | ScienceDirect Freedom Collection |
subjects | Applied sciences Electronics Exact sciences and technology Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Transistors |
title | Degradation dynamics, recovery, and characterization of negative bias temperature instability: Negative-Bias-Temperature Instability (NBTI) in MOS devices special sectio n |
url | http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-17T16%3A40%3A53IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-pascalfrancis&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Degradation%20dynamics,%20recovery,%20and%20characterization%20of%20negative%20bias%20temperature%20instability:%20Negative-Bias-Temperature%20Instability%20(NBTI)%20in%20MOS%20devices%20special%20sectio%20n&rft.jtitle=Microelectronics%20and%20reliability&rft.au=ERSHOV,%20M&rft.date=2005&rft.volume=45&rft.issue=1&rft.spage=99&rft.epage=105&rft.pages=99-105&rft.issn=0026-2714&rft.coden=MCRLAS&rft_id=info:doi/&rft_dat=%3Cpascalfrancis%3E16404643%3C/pascalfrancis%3E%3Cgrp_id%3Ecdi_FETCH-pascalfrancis_primary_164046433%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |