Shape-optimized electrooptic beam scanners: analysis, design, and simulation

This paper presents the analysis of a general nonrectangular electrooptic (EO) scanner and compare its performance to a rectangular device. Since the scanning sensitivity of an EO scanner is inversely proportional to its width, high sensitivity requires the device contour to be close to the ray traj...

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Bibliographic Details
Published in:Journal of lightwave technology 1999-01, Vol.17 (1), p.108-114
Main Authors: Yi Chiu, Jie Zou, Stancil, D.D., Schlesinger, T.E.
Format: Article
Language:English
Subjects:
Analytical models
Apertures
Applied sciences
Bandwidth
Beams (radiation)
Business process management
Circuit properties
Devices
Electric, optical and optoelectronic circuits
Electronics
Electrooptic deflectors
Electrooptic devices
Electrooptics
Equations
Exact sciences and technology
Integrated optics. Optical fibers and wave guides
Laser beams
Optical and optoelectronic circuits
Optical propagation
Performance analysis
Ray tracing
Scanners
Shape
Simulation
Trajectories
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Summary:This paper presents the analysis of a general nonrectangular electrooptic (EO) scanner and compare its performance to a rectangular device. Since the scanning sensitivity of an EO scanner is inversely proportional to its width, high sensitivity requires the device contour to be close to the ray trajectory of a beam propagating through the device. Accordingly, a shaped-optimized scanner is designed so that the beam trajectory at maximum deflection is parallel to the device contour. A beam propagation method (BPM) simulation shows the performance agrees well with the analysis.
ISSN:0733-8724
1558-2213
DOI:10.1109/50.737429