Effective post-etch residue removal on low-K films using single wafer processing

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Bibliographic Details
Main Authors: KESTERS, E, GHEKIERE, J, VAN DOORNE, P, VEREECKE, G, MERTENS, P. M, HEYNS, M. M
Format: Conference Proceeding
Language:English
Subjects:
Applied sciences
Electronics
Exact sciences and technology
Microelectronic fabrication (materials and surfaces technology)
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Online Access:Get full text
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ISSN:0161-6374
2576-1579