Materials issues of Ni fully silicided (FUSI) gates for CMOS applications

Saved in:
Bibliographic Details
Main Authors: KITTL, J. A, LAUWERS, A, KUBICEK, S, CUNNIFFE, J, VERBEECK, R, VRANCKEN, C, BIESEMANS, S, MAEX, K, PAWLAK, M. A, DEMEURISSE, C, ANIL, K. G, VELOSO, A, VAN DAL, M. J. H, SCHRAM, T, BRIJS, B, KAISER, M
Format: Conference Proceeding
Language:English
Subjects:
Applied sciences
Design. Technologies. Operation analysis. Testing
Electronics
Exact sciences and technology
Integrated circuits
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:
ISSN:0161-6374
2576-1579