Challenges for interconnect of future CMOS generations : Implementation of emerging processes and alternative architectures

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Main Authors: ARNAL, V, GOSSET, L. G, GUILLAUMOND, J. F, TORRES, J, BESLING, W. F. A, FARCY, A, CHAPELON, L. L, FUCHSMANN, A, VITIELLO, J, CHHUN, S, AIMADEDDINE, M, GUEDJ, C
Format: Conference Proceeding
Language:English
Subjects:
Applied sciences
Design. Technologies. Operation analysis. Testing
Electronics
Exact sciences and technology
Integrated circuits
Microelectronic fabrication (materials and surfaces technology)
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
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creator ARNAL, V
GOSSET, L. G
GUILLAUMOND, J. F
TORRES, J
BESLING, W. F. A
FARCY, A
CHAPELON, L. L
FUCHSMANN, A
VITIELLO, J
CHHUN, S
AIMADEDDINE, M
GUEDJ, C
description
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fullrecord <record><control><sourceid>pascalfrancis</sourceid><recordid>TN_cdi_pascalfrancis_primary_17162731</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>17162731</sourcerecordid><originalsourceid>FETCH-pascalfrancis_primary_171627313</originalsourceid><addsrcrecordid>eNqNzE1KBDEQhuGgI9iOc4fauGxI-idh3DaKLsSF7ocQKz2RdKVJZQTx8kbxAK6Kr3h5zkTTjUa3ajT7c3GlRq2NGfQgN6KRSqtW92a4FDvmdyll16tR7YdGfE1HGyPSjAw-ZQhUMLtEhK5A8uBP5ZQRpqfnF5iRMNsSEjHcwuOyRlyQyu_np60rz4FmWHNyyFxJS29gYyWpVh8INrtjKNWuKF-LC28j4-7vbsXN_d3r9NCulp2NPltygQ9rDovNnwdllO5Mr_r_dt9OuVXf</addsrcrecordid><sourcetype>Index Database</sourcetype><iscdi>true</iscdi><recordtype>conference_proceeding</recordtype></control><display><type>conference_proceeding</type><title>Challenges for interconnect of future CMOS generations : Implementation of emerging processes and alternative architectures</title><source>IOPscience extra</source><creator>ARNAL, V ; GOSSET, L. G ; GUILLAUMOND, J. F ; TORRES, J ; BESLING, W. F. A ; FARCY, A ; CHAPELON, L. L ; FUCHSMANN, A ; VITIELLO, J ; CHHUN, S ; AIMADEDDINE, M ; GUEDJ, C</creator><creatorcontrib>ARNAL, V ; GOSSET, L. G ; GUILLAUMOND, J. F ; TORRES, J ; BESLING, W. F. A ; FARCY, A ; CHAPELON, L. L ; FUCHSMANN, A ; VITIELLO, J ; CHHUN, S ; AIMADEDDINE, M ; GUEDJ, C</creatorcontrib><identifier>ISSN: 0161-6374</identifier><identifier>ISBN: 1566774640</identifier><identifier>ISBN: 9781566774642</identifier><identifier>EISSN: 2576-1579</identifier><language>eng</language><publisher>Pennington NJ: Electrochemical Society</publisher><subject>Applied sciences ; Design. Technologies. Operation analysis. Testing ; Electronics ; Exact sciences and technology ; Integrated circuits ; Microelectronic fabrication (materials and surfaces technology) ; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</subject><ispartof>Proceedings - Electrochemical Society, 2005, p.221-234</ispartof><rights>2005 INIST-CNRS</rights><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>309,310,780,784,789,790,4050,4051,23930,23931,25140</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&amp;idt=17162731$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>ARNAL, V</creatorcontrib><creatorcontrib>GOSSET, L. G</creatorcontrib><creatorcontrib>GUILLAUMOND, J. F</creatorcontrib><creatorcontrib>TORRES, J</creatorcontrib><creatorcontrib>BESLING, W. F. A</creatorcontrib><creatorcontrib>FARCY, A</creatorcontrib><creatorcontrib>CHAPELON, L. L</creatorcontrib><creatorcontrib>FUCHSMANN, A</creatorcontrib><creatorcontrib>VITIELLO, J</creatorcontrib><creatorcontrib>CHHUN, S</creatorcontrib><creatorcontrib>AIMADEDDINE, M</creatorcontrib><creatorcontrib>GUEDJ, C</creatorcontrib><title>Challenges for interconnect of future CMOS generations : Implementation of emerging processes and alternative architectures</title><title>Proceedings - Electrochemical Society</title><subject>Applied sciences</subject><subject>Design. Technologies. Operation analysis. Testing</subject><subject>Electronics</subject><subject>Exact sciences and technology</subject><subject>Integrated circuits</subject><subject>Microelectronic fabrication (materials and surfaces technology)</subject><subject>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</subject><issn>0161-6374</issn><issn>2576-1579</issn><isbn>1566774640</isbn><isbn>9781566774642</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>2005</creationdate><recordtype>conference_proceeding</recordtype><recordid>eNqNzE1KBDEQhuGgI9iOc4fauGxI-idh3DaKLsSF7ocQKz2RdKVJZQTx8kbxAK6Kr3h5zkTTjUa3ajT7c3GlRq2NGfQgN6KRSqtW92a4FDvmdyll16tR7YdGfE1HGyPSjAw-ZQhUMLtEhK5A8uBP5ZQRpqfnF5iRMNsSEjHcwuOyRlyQyu_np60rz4FmWHNyyFxJS29gYyWpVh8INrtjKNWuKF-LC28j4-7vbsXN_d3r9NCulp2NPltygQ9rDovNnwdllO5Mr_r_dt9OuVXf</recordid><startdate>2005</startdate><enddate>2005</enddate><creator>ARNAL, V</creator><creator>GOSSET, L. G</creator><creator>GUILLAUMOND, J. F</creator><creator>TORRES, J</creator><creator>BESLING, W. F. A</creator><creator>FARCY, A</creator><creator>CHAPELON, L. L</creator><creator>FUCHSMANN, A</creator><creator>VITIELLO, J</creator><creator>CHHUN, S</creator><creator>AIMADEDDINE, M</creator><creator>GUEDJ, C</creator><general>Electrochemical Society</general><scope>IQODW</scope></search><sort><creationdate>2005</creationdate><title>Challenges for interconnect of future CMOS generations : Implementation of emerging processes and alternative architectures</title><author>ARNAL, V ; GOSSET, L. G ; GUILLAUMOND, J. F ; TORRES, J ; BESLING, W. F. A ; FARCY, A ; CHAPELON, L. L ; FUCHSMANN, A ; VITIELLO, J ; CHHUN, S ; AIMADEDDINE, M ; GUEDJ, C</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-pascalfrancis_primary_171627313</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>2005</creationdate><topic>Applied sciences</topic><topic>Design. Technologies. Operation analysis. Testing</topic><topic>Electronics</topic><topic>Exact sciences and technology</topic><topic>Integrated circuits</topic><topic>Microelectronic fabrication (materials and surfaces technology)</topic><topic>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</topic><toplevel>online_resources</toplevel><creatorcontrib>ARNAL, V</creatorcontrib><creatorcontrib>GOSSET, L. G</creatorcontrib><creatorcontrib>GUILLAUMOND, J. F</creatorcontrib><creatorcontrib>TORRES, J</creatorcontrib><creatorcontrib>BESLING, W. F. A</creatorcontrib><creatorcontrib>FARCY, A</creatorcontrib><creatorcontrib>CHAPELON, L. L</creatorcontrib><creatorcontrib>FUCHSMANN, A</creatorcontrib><creatorcontrib>VITIELLO, J</creatorcontrib><creatorcontrib>CHHUN, S</creatorcontrib><creatorcontrib>AIMADEDDINE, M</creatorcontrib><creatorcontrib>GUEDJ, C</creatorcontrib><collection>Pascal-Francis</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>ARNAL, V</au><au>GOSSET, L. G</au><au>GUILLAUMOND, J. F</au><au>TORRES, J</au><au>BESLING, W. F. A</au><au>FARCY, A</au><au>CHAPELON, L. L</au><au>FUCHSMANN, A</au><au>VITIELLO, J</au><au>CHHUN, S</au><au>AIMADEDDINE, M</au><au>GUEDJ, C</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>Challenges for interconnect of future CMOS generations : Implementation of emerging processes and alternative architectures</atitle><btitle>Proceedings - Electrochemical Society</btitle><date>2005</date><risdate>2005</risdate><spage>221</spage><epage>234</epage><pages>221-234</pages><issn>0161-6374</issn><eissn>2576-1579</eissn><isbn>1566774640</isbn><isbn>9781566774642</isbn><cop>Pennington NJ</cop><pub>Electrochemical Society</pub></addata></record>
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ispartof Proceedings - Electrochemical Society, 2005, p.221-234
issn 0161-6374
2576-1579
language eng
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source IOPscience extra
subjects Applied sciences
Design. Technologies. Operation analysis. Testing
Electronics
Exact sciences and technology
Integrated circuits
Microelectronic fabrication (materials and surfaces technology)
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
title Challenges for interconnect of future CMOS generations : Implementation of emerging processes and alternative architectures
url http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-26T22%3A15%3A20IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-pascalfrancis&rft_val_fmt=info:ofi/fmt:kev:mtx:book&rft.genre=proceeding&rft.atitle=Challenges%20for%20interconnect%20of%20future%20CMOS%20generations%20:%20Implementation%20of%20emerging%20processes%20and%20alternative%20architectures&rft.btitle=Proceedings%20-%20Electrochemical%20Society&rft.au=ARNAL,%20V&rft.date=2005&rft.spage=221&rft.epage=234&rft.pages=221-234&rft.issn=0161-6374&rft.eissn=2576-1579&rft.isbn=1566774640&rft.isbn_list=9781566774642&rft_id=info:doi/&rft_dat=%3Cpascalfrancis%3E17162731%3C/pascalfrancis%3E%3Cgrp_id%3Ecdi_FETCH-pascalfrancis_primary_171627313%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true