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Influence of tungsten sputtering target density on physical vapor deposition thin film properties : Microstructures and textures of films and coatings and refractory metals in electronic applications

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Bibliographic Details
Main Authors: LO, Chi-Fung, MCDONALD, Peter, DRAPER, Darryl, GILMAN, Paul
Format: Conference Proceeding
Language:English
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ISSN:0361-5235
1543-186X