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Influence of tungsten sputtering target density on physical vapor deposition thin film properties : Microstructures and textures of films and coatings and refractory metals in electronic applications
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Main Authors: | , , , |
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Format: | Conference Proceeding |
Language: | English |
Subjects: | |
Online Access: | Get full text |
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ISSN: | 0361-5235 1543-186X |