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Nitridation of porous GaAs by an ECR ammonia plasma

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Published in:	Plasma sources science & technology 2006-02, Vol.15 (1), p.33-36
Main Authors:	Naddaf, M, Hullavarad, S S, Ganesan, V, Bhoraskar, S V
Format:	Article
Language:	English
Subjects:	Cross-disciplinary physics: materials science rheology Exact sciences and technology Materials science Physics Physics of gases, plasmas and electric discharges Physics of plasmas and electric discharges Plasma applications Plasma-based ion implantation and deposition Surface hardening: nitridation, carburization, carbonitridation Surface treatments
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source	Institute of Physics:Jisc Collections:IOP Publishing Read and Publish 2024-2025 (Reading List)
subjects	Cross-disciplinary physics: materials science rheology Exact sciences and technology Materials science Physics Physics of gases, plasmas and electric discharges Physics of plasmas and electric discharges Plasma applications Plasma-based ion implantation and deposition Surface hardening: nitridation, carburization, carbonitridation Surface treatments
title	Nitridation of porous GaAs by an ECR ammonia plasma
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