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Two-photon 3D lithography: materials and applications
This study demonstrates the fabrication of a representative set of microstructures based on the three classes of two-photon photoactive materials compositions. Such structures can be used directly for suitable applications but can also be used as templates for the growth or molding of other material...
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container_end_page | 562 Vol.2 |
container_issue | |
container_start_page | 561 |
container_title | |
container_volume | 2 |
creator | Kuebler, S.M.B. Braun, K.L. Stellacci, F. Bauer, C.A. Halik, M. Wenhui Zhou Tianyue Yu Ober, C.K. Marder, S.R. Perry, J.W. |
description | This study demonstrates the fabrication of a representative set of microstructures based on the three classes of two-photon photoactive materials compositions. Such structures can be used directly for suitable applications but can also be used as templates for the growth or molding of other materials as needed for a specific application. Given the ability of the two-photon lithography to produce 3D patterns of arbitrary structure, there is potential for the fabrication of an essentially limitless number of micro- and nano-structures in a wide variety of materials compositions. |
doi_str_mv | 10.1109/LEOS.2004.1363362 |
format | conference_proceeding |
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Given the ability of the two-photon lithography to produce 3D patterns of arbitrary structure, there is potential for the fabrication of an essentially limitless number of micro- and nano-structures in a wide variety of materials compositions.</description><subject>Absorption</subject><subject>Applied sciences</subject><subject>Chemistry</subject><subject>Electronics</subject><subject>Exact sciences and technology</subject><subject>Lithography</subject><subject>Materials science and technology</subject><subject>Microelectronic fabrication (materials and surfaces technology)</subject><subject>Microstructure</subject><subject>Optical device fabrication</subject><subject>Photochemistry</subject><subject>Polymers</subject><subject>Power generation</subject><subject>Resists</subject><subject>Semiconductor electronics. Microelectronics. Optoelectronics. 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LEOS 2004</btitle><stitle>LEOS</stitle><date>2004</date><risdate>2004</risdate><volume>2</volume><spage>561</spage><epage>562 Vol.2</epage><pages>561-562 Vol.2</pages><isbn>0780385578</isbn><isbn>9780780385573</isbn><abstract>This study demonstrates the fabrication of a representative set of microstructures based on the three classes of two-photon photoactive materials compositions. Such structures can be used directly for suitable applications but can also be used as templates for the growth or molding of other materials as needed for a specific application. Given the ability of the two-photon lithography to produce 3D patterns of arbitrary structure, there is potential for the fabrication of an essentially limitless number of micro- and nano-structures in a wide variety of materials compositions.</abstract><cop>Piscataway NJ</cop><pub>IEEE</pub><doi>10.1109/LEOS.2004.1363362</doi></addata></record> |
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identifier | ISBN: 0780385578 |
ispartof | The 17th Annual Meeting of the IEEELasers and Electro-Optics Society, 2004. LEOS 2004, 2004, Vol.2, p.561-562 Vol.2 |
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language | eng |
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source | IEEE Electronic Library (IEL) Conference Proceedings |
subjects | Absorption Applied sciences Chemistry Electronics Exact sciences and technology Lithography Materials science and technology Microelectronic fabrication (materials and surfaces technology) Microstructure Optical device fabrication Photochemistry Polymers Power generation Resists Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices |
title | Two-photon 3D lithography: materials and applications |
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