Selective and nonselective wet etching of Zn0.9Mg0.1O/ZnO: Group III Nitrides, SiC, and ZnO

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Bibliographic Details
Published in:Journal of electronic materials 2006, Vol.35 (4), p.516-519
Main Authors: CHEN, Jau-Jiun, JANG, Soohwan, REN, F, YUANJIE LI, KIM, Hyun-Sik, NORTON, D. P, PEARTON, S. J, OSINSKY, A, CHU, S. N. G, WEAVER, J. F
Format: Article
Language:English
Subjects:
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Laser deposition
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Physics
Surface cleaning, etching, patterning
Surface treatments
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ISSN:0361-5235
1543-186X