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Metal emitter SiGe:C HBTs

SiGe:C heterojunction bipolar transistors (HBTs) offer high cut-off frequencies, f/sub T/, but low open base breakdown voltages, BV/sub CEO/, due to the relatively high current gain, h/sub FE/. In this paper, we show that the integration of a metal emitter, made by complete silicidation of a mono-em...

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Main Authors: Donkers, J.J.T.M., Vanhoucke, T., Agarwal, P., Hueting, R.J.E., Meunier-Beillard, P., Vijayaraghavan, M.N., Magnee, P.H.C., Verheijen, M.A., de Kort, R., Slotboom, J.W.
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creator Donkers, J.J.T.M.
Vanhoucke, T.
Agarwal, P.
Hueting, R.J.E.
Meunier-Beillard, P.
Vijayaraghavan, M.N.
Magnee, P.H.C.
Verheijen, M.A.
de Kort, R.
Slotboom, J.W.
description SiGe:C heterojunction bipolar transistors (HBTs) offer high cut-off frequencies, f/sub T/, but low open base breakdown voltages, BV/sub CEO/, due to the relatively high current gain, h/sub FE/. In this paper, we show that the integration of a metal emitter, made by complete silicidation of a mono-emitter, increases the base current, I/sub B/ without reducing the collector current, I/sub C/. Hence, the BV/sub CEO/ is increased without affecting the f/sub T/. Furthermore, this metal emitter reduces the emitter series resistance, R/sub E/, and increases the f/sub T/ compared with a mono-emitter. SiGe:C HBTs with f/sub T/=230GHz and BV/sub CEO/=1.8V have been realised using a metal emitter in a self-aligned integration scheme.
doi_str_mv 10.1109/IEDM.2004.1419121
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fullrecord <record><control><sourceid>pascalfrancis_6IE</sourceid><recordid>TN_cdi_pascalfrancis_primary_17806405</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>1419121</ieee_id><sourcerecordid>17806405</sourcerecordid><originalsourceid>FETCH-LOGICAL-i135t-6517230cdeafd67487c61faa5c232466d14ffcc1e6a071a725080ae20421cbc93</originalsourceid><addsrcrecordid>eNpFj09Lw0AUxBdEUGs_QPGSi8fE9_Z_vGmsbaHFQ9tzeW7ewkoqJZuL395ABOcyh_kxzAixQKgQoX7aLN92lQTQFWqsUeKVuAPnQXnrNd6Iec5fMEobDV7disWOB-oKPqdh4L7YpxU_N8X69ZDvxXWkLvP8z2fi-L48NOty-7HaNC_bMqEyQ2kNOqkgtEyxtU57FyxGIhOkktraFnWMISBbAofkpAEPxBK0xPAZajUTj1PvhXKgLvb0HVI-Xfp0pv7nhON4q8GM3MPEJWb-j6eX6hcZFkRa</addsrcrecordid><sourcetype>Index Database</sourcetype><iscdi>true</iscdi><recordtype>conference_proceeding</recordtype></control><display><type>conference_proceeding</type><title>Metal emitter SiGe:C HBTs</title><source>IEEE Electronic Library (IEL) Conference Proceedings</source><creator>Donkers, J.J.T.M. ; Vanhoucke, T. ; Agarwal, P. ; Hueting, R.J.E. ; Meunier-Beillard, P. ; Vijayaraghavan, M.N. ; Magnee, P.H.C. ; Verheijen, M.A. ; de Kort, R. ; Slotboom, J.W.</creator><creatorcontrib>Donkers, J.J.T.M. ; Vanhoucke, T. ; Agarwal, P. ; Hueting, R.J.E. ; Meunier-Beillard, P. ; Vijayaraghavan, M.N. ; Magnee, P.H.C. ; Verheijen, M.A. ; de Kort, R. ; Slotboom, J.W.</creatorcontrib><description>SiGe:C heterojunction bipolar transistors (HBTs) offer high cut-off frequencies, f/sub T/, but low open base breakdown voltages, BV/sub CEO/, due to the relatively high current gain, h/sub FE/. In this paper, we show that the integration of a metal emitter, made by complete silicidation of a mono-emitter, increases the base current, I/sub B/ without reducing the collector current, I/sub C/. Hence, the BV/sub CEO/ is increased without affecting the f/sub T/. Furthermore, this metal emitter reduces the emitter series resistance, R/sub E/, and increases the f/sub T/ compared with a mono-emitter. SiGe:C HBTs with f/sub T/=230GHz and BV/sub CEO/=1.8V have been realised using a metal emitter in a self-aligned integration scheme.</description><identifier>ISBN: 0780386841</identifier><identifier>ISBN: 9780780386846</identifier><identifier>DOI: 10.1109/IEDM.2004.1419121</identifier><language>eng</language><publisher>Piscataway NJ: IEEE</publisher><subject>Applied sciences ; Atomic layer deposition ; Bipolar transistors ; Cutoff frequency ; Electronics ; Exact sciences and technology ; Germanium silicon alloys ; Heterojunction bipolar transistors ; Laboratories ; Nickel ; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices ; Silicidation ; Silicon germanium ; Temperature ; Transistors</subject><ispartof>2004 International Electron Devices Meeting, 2004, p.243-246</ispartof><rights>2006 INIST-CNRS</rights><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/1419121$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>309,310,780,784,789,790,2058,4050,4051,27925,54920</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/1419121$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&amp;idt=17806405$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Donkers, J.J.T.M.</creatorcontrib><creatorcontrib>Vanhoucke, T.</creatorcontrib><creatorcontrib>Agarwal, P.</creatorcontrib><creatorcontrib>Hueting, R.J.E.</creatorcontrib><creatorcontrib>Meunier-Beillard, P.</creatorcontrib><creatorcontrib>Vijayaraghavan, M.N.</creatorcontrib><creatorcontrib>Magnee, P.H.C.</creatorcontrib><creatorcontrib>Verheijen, M.A.</creatorcontrib><creatorcontrib>de Kort, R.</creatorcontrib><creatorcontrib>Slotboom, J.W.</creatorcontrib><title>Metal emitter SiGe:C HBTs</title><title>2004 International Electron Devices Meeting</title><addtitle>IEDM</addtitle><description>SiGe:C heterojunction bipolar transistors (HBTs) offer high cut-off frequencies, f/sub T/, but low open base breakdown voltages, BV/sub CEO/, due to the relatively high current gain, h/sub FE/. In this paper, we show that the integration of a metal emitter, made by complete silicidation of a mono-emitter, increases the base current, I/sub B/ without reducing the collector current, I/sub C/. Hence, the BV/sub CEO/ is increased without affecting the f/sub T/. Furthermore, this metal emitter reduces the emitter series resistance, R/sub E/, and increases the f/sub T/ compared with a mono-emitter. SiGe:C HBTs with f/sub T/=230GHz and BV/sub CEO/=1.8V have been realised using a metal emitter in a self-aligned integration scheme.</description><subject>Applied sciences</subject><subject>Atomic layer deposition</subject><subject>Bipolar transistors</subject><subject>Cutoff frequency</subject><subject>Electronics</subject><subject>Exact sciences and technology</subject><subject>Germanium silicon alloys</subject><subject>Heterojunction bipolar transistors</subject><subject>Laboratories</subject><subject>Nickel</subject><subject>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</subject><subject>Silicidation</subject><subject>Silicon germanium</subject><subject>Temperature</subject><subject>Transistors</subject><isbn>0780386841</isbn><isbn>9780780386846</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>2004</creationdate><recordtype>conference_proceeding</recordtype><sourceid>6IE</sourceid><recordid>eNpFj09Lw0AUxBdEUGs_QPGSi8fE9_Z_vGmsbaHFQ9tzeW7ewkoqJZuL395ABOcyh_kxzAixQKgQoX7aLN92lQTQFWqsUeKVuAPnQXnrNd6Iec5fMEobDV7disWOB-oKPqdh4L7YpxU_N8X69ZDvxXWkLvP8z2fi-L48NOty-7HaNC_bMqEyQ2kNOqkgtEyxtU57FyxGIhOkktraFnWMISBbAofkpAEPxBK0xPAZajUTj1PvhXKgLvb0HVI-Xfp0pv7nhON4q8GM3MPEJWb-j6eX6hcZFkRa</recordid><startdate>2004</startdate><enddate>2004</enddate><creator>Donkers, J.J.T.M.</creator><creator>Vanhoucke, T.</creator><creator>Agarwal, P.</creator><creator>Hueting, R.J.E.</creator><creator>Meunier-Beillard, P.</creator><creator>Vijayaraghavan, M.N.</creator><creator>Magnee, P.H.C.</creator><creator>Verheijen, M.A.</creator><creator>de Kort, R.</creator><creator>Slotboom, J.W.</creator><general>IEEE</general><scope>6IE</scope><scope>6IH</scope><scope>CBEJK</scope><scope>RIE</scope><scope>RIO</scope><scope>IQODW</scope></search><sort><creationdate>2004</creationdate><title>Metal emitter SiGe:C HBTs</title><author>Donkers, J.J.T.M. ; Vanhoucke, T. ; Agarwal, P. ; Hueting, R.J.E. ; Meunier-Beillard, P. ; Vijayaraghavan, M.N. ; Magnee, P.H.C. ; Verheijen, M.A. ; de Kort, R. ; Slotboom, J.W.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-i135t-6517230cdeafd67487c61faa5c232466d14ffcc1e6a071a725080ae20421cbc93</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>2004</creationdate><topic>Applied sciences</topic><topic>Atomic layer deposition</topic><topic>Bipolar transistors</topic><topic>Cutoff frequency</topic><topic>Electronics</topic><topic>Exact sciences and technology</topic><topic>Germanium silicon alloys</topic><topic>Heterojunction bipolar transistors</topic><topic>Laboratories</topic><topic>Nickel</topic><topic>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</topic><topic>Silicidation</topic><topic>Silicon germanium</topic><topic>Temperature</topic><topic>Transistors</topic><toplevel>online_resources</toplevel><creatorcontrib>Donkers, J.J.T.M.</creatorcontrib><creatorcontrib>Vanhoucke, T.</creatorcontrib><creatorcontrib>Agarwal, P.</creatorcontrib><creatorcontrib>Hueting, R.J.E.</creatorcontrib><creatorcontrib>Meunier-Beillard, P.</creatorcontrib><creatorcontrib>Vijayaraghavan, M.N.</creatorcontrib><creatorcontrib>Magnee, P.H.C.</creatorcontrib><creatorcontrib>Verheijen, M.A.</creatorcontrib><creatorcontrib>de Kort, R.</creatorcontrib><creatorcontrib>Slotboom, J.W.</creatorcontrib><collection>IEEE Electronic Library (IEL) Conference Proceedings</collection><collection>IEEE Proceedings Order Plan (POP) 1998-present by volume</collection><collection>IEEE Xplore All Conference Proceedings</collection><collection>IEEE/IET Electronic Library</collection><collection>IEEE Proceedings Order Plans (POP) 1998-present</collection><collection>Pascal-Francis</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Donkers, J.J.T.M.</au><au>Vanhoucke, T.</au><au>Agarwal, P.</au><au>Hueting, R.J.E.</au><au>Meunier-Beillard, P.</au><au>Vijayaraghavan, M.N.</au><au>Magnee, P.H.C.</au><au>Verheijen, M.A.</au><au>de Kort, R.</au><au>Slotboom, J.W.</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>Metal emitter SiGe:C HBTs</atitle><btitle>2004 International Electron Devices Meeting</btitle><stitle>IEDM</stitle><date>2004</date><risdate>2004</risdate><spage>243</spage><epage>246</epage><pages>243-246</pages><isbn>0780386841</isbn><isbn>9780780386846</isbn><abstract>SiGe:C heterojunction bipolar transistors (HBTs) offer high cut-off frequencies, f/sub T/, but low open base breakdown voltages, BV/sub CEO/, due to the relatively high current gain, h/sub FE/. In this paper, we show that the integration of a metal emitter, made by complete silicidation of a mono-emitter, increases the base current, I/sub B/ without reducing the collector current, I/sub C/. Hence, the BV/sub CEO/ is increased without affecting the f/sub T/. Furthermore, this metal emitter reduces the emitter series resistance, R/sub E/, and increases the f/sub T/ compared with a mono-emitter. SiGe:C HBTs with f/sub T/=230GHz and BV/sub CEO/=1.8V have been realised using a metal emitter in a self-aligned integration scheme.</abstract><cop>Piscataway NJ</cop><pub>IEEE</pub><doi>10.1109/IEDM.2004.1419121</doi><tpages>4</tpages></addata></record>
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identifier ISBN: 0780386841
ispartof 2004 International Electron Devices Meeting, 2004, p.243-246
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source IEEE Electronic Library (IEL) Conference Proceedings
subjects Applied sciences
Atomic layer deposition
Bipolar transistors
Cutoff frequency
Electronics
Exact sciences and technology
Germanium silicon alloys
Heterojunction bipolar transistors
Laboratories
Nickel
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Silicidation
Silicon germanium
Temperature
Transistors
title Metal emitter SiGe:C HBTs
url http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-06T05%3A33%3A12IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-pascalfrancis_6IE&rft_val_fmt=info:ofi/fmt:kev:mtx:book&rft.genre=proceeding&rft.atitle=Metal%20emitter%20SiGe:C%20HBTs&rft.btitle=2004%20International%20Electron%20Devices%20Meeting&rft.au=Donkers,%20J.J.T.M.&rft.date=2004&rft.spage=243&rft.epage=246&rft.pages=243-246&rft.isbn=0780386841&rft.isbn_list=9780780386846&rft_id=info:doi/10.1109/IEDM.2004.1419121&rft_dat=%3Cpascalfrancis_6IE%3E17806405%3C/pascalfrancis_6IE%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-i135t-6517230cdeafd67487c61faa5c232466d14ffcc1e6a071a725080ae20421cbc93%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_id=info:pmid/&rft_ieee_id=1419121&rfr_iscdi=true