Loading…
Metal emitter SiGe:C HBTs
SiGe:C heterojunction bipolar transistors (HBTs) offer high cut-off frequencies, f/sub T/, but low open base breakdown voltages, BV/sub CEO/, due to the relatively high current gain, h/sub FE/. In this paper, we show that the integration of a metal emitter, made by complete silicidation of a mono-em...
Saved in:
Main Authors: | , , , , , , , , , |
---|---|
Format: | Conference Proceeding |
Language: | English |
Subjects: | |
Online Access: | Request full text |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
cited_by | |
---|---|
cites | |
container_end_page | 246 |
container_issue | |
container_start_page | 243 |
container_title | |
container_volume | |
creator | Donkers, J.J.T.M. Vanhoucke, T. Agarwal, P. Hueting, R.J.E. Meunier-Beillard, P. Vijayaraghavan, M.N. Magnee, P.H.C. Verheijen, M.A. de Kort, R. Slotboom, J.W. |
description | SiGe:C heterojunction bipolar transistors (HBTs) offer high cut-off frequencies, f/sub T/, but low open base breakdown voltages, BV/sub CEO/, due to the relatively high current gain, h/sub FE/. In this paper, we show that the integration of a metal emitter, made by complete silicidation of a mono-emitter, increases the base current, I/sub B/ without reducing the collector current, I/sub C/. Hence, the BV/sub CEO/ is increased without affecting the f/sub T/. Furthermore, this metal emitter reduces the emitter series resistance, R/sub E/, and increases the f/sub T/ compared with a mono-emitter. SiGe:C HBTs with f/sub T/=230GHz and BV/sub CEO/=1.8V have been realised using a metal emitter in a self-aligned integration scheme. |
doi_str_mv | 10.1109/IEDM.2004.1419121 |
format | conference_proceeding |
fullrecord | <record><control><sourceid>pascalfrancis_6IE</sourceid><recordid>TN_cdi_pascalfrancis_primary_17806405</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>1419121</ieee_id><sourcerecordid>17806405</sourcerecordid><originalsourceid>FETCH-LOGICAL-i135t-6517230cdeafd67487c61faa5c232466d14ffcc1e6a071a725080ae20421cbc93</originalsourceid><addsrcrecordid>eNpFj09Lw0AUxBdEUGs_QPGSi8fE9_Z_vGmsbaHFQ9tzeW7ewkoqJZuL395ABOcyh_kxzAixQKgQoX7aLN92lQTQFWqsUeKVuAPnQXnrNd6Iec5fMEobDV7disWOB-oKPqdh4L7YpxU_N8X69ZDvxXWkLvP8z2fi-L48NOty-7HaNC_bMqEyQ2kNOqkgtEyxtU57FyxGIhOkktraFnWMISBbAofkpAEPxBK0xPAZajUTj1PvhXKgLvb0HVI-Xfp0pv7nhON4q8GM3MPEJWb-j6eX6hcZFkRa</addsrcrecordid><sourcetype>Index Database</sourcetype><iscdi>true</iscdi><recordtype>conference_proceeding</recordtype></control><display><type>conference_proceeding</type><title>Metal emitter SiGe:C HBTs</title><source>IEEE Electronic Library (IEL) Conference Proceedings</source><creator>Donkers, J.J.T.M. ; Vanhoucke, T. ; Agarwal, P. ; Hueting, R.J.E. ; Meunier-Beillard, P. ; Vijayaraghavan, M.N. ; Magnee, P.H.C. ; Verheijen, M.A. ; de Kort, R. ; Slotboom, J.W.</creator><creatorcontrib>Donkers, J.J.T.M. ; Vanhoucke, T. ; Agarwal, P. ; Hueting, R.J.E. ; Meunier-Beillard, P. ; Vijayaraghavan, M.N. ; Magnee, P.H.C. ; Verheijen, M.A. ; de Kort, R. ; Slotboom, J.W.</creatorcontrib><description>SiGe:C heterojunction bipolar transistors (HBTs) offer high cut-off frequencies, f/sub T/, but low open base breakdown voltages, BV/sub CEO/, due to the relatively high current gain, h/sub FE/. In this paper, we show that the integration of a metal emitter, made by complete silicidation of a mono-emitter, increases the base current, I/sub B/ without reducing the collector current, I/sub C/. Hence, the BV/sub CEO/ is increased without affecting the f/sub T/. Furthermore, this metal emitter reduces the emitter series resistance, R/sub E/, and increases the f/sub T/ compared with a mono-emitter. SiGe:C HBTs with f/sub T/=230GHz and BV/sub CEO/=1.8V have been realised using a metal emitter in a self-aligned integration scheme.</description><identifier>ISBN: 0780386841</identifier><identifier>ISBN: 9780780386846</identifier><identifier>DOI: 10.1109/IEDM.2004.1419121</identifier><language>eng</language><publisher>Piscataway NJ: IEEE</publisher><subject>Applied sciences ; Atomic layer deposition ; Bipolar transistors ; Cutoff frequency ; Electronics ; Exact sciences and technology ; Germanium silicon alloys ; Heterojunction bipolar transistors ; Laboratories ; Nickel ; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices ; Silicidation ; Silicon germanium ; Temperature ; Transistors</subject><ispartof>2004 International Electron Devices Meeting, 2004, p.243-246</ispartof><rights>2006 INIST-CNRS</rights><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/1419121$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>309,310,780,784,789,790,2058,4050,4051,27925,54920</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/1419121$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=17806405$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Donkers, J.J.T.M.</creatorcontrib><creatorcontrib>Vanhoucke, T.</creatorcontrib><creatorcontrib>Agarwal, P.</creatorcontrib><creatorcontrib>Hueting, R.J.E.</creatorcontrib><creatorcontrib>Meunier-Beillard, P.</creatorcontrib><creatorcontrib>Vijayaraghavan, M.N.</creatorcontrib><creatorcontrib>Magnee, P.H.C.</creatorcontrib><creatorcontrib>Verheijen, M.A.</creatorcontrib><creatorcontrib>de Kort, R.</creatorcontrib><creatorcontrib>Slotboom, J.W.</creatorcontrib><title>Metal emitter SiGe:C HBTs</title><title>2004 International Electron Devices Meeting</title><addtitle>IEDM</addtitle><description>SiGe:C heterojunction bipolar transistors (HBTs) offer high cut-off frequencies, f/sub T/, but low open base breakdown voltages, BV/sub CEO/, due to the relatively high current gain, h/sub FE/. In this paper, we show that the integration of a metal emitter, made by complete silicidation of a mono-emitter, increases the base current, I/sub B/ without reducing the collector current, I/sub C/. Hence, the BV/sub CEO/ is increased without affecting the f/sub T/. Furthermore, this metal emitter reduces the emitter series resistance, R/sub E/, and increases the f/sub T/ compared with a mono-emitter. SiGe:C HBTs with f/sub T/=230GHz and BV/sub CEO/=1.8V have been realised using a metal emitter in a self-aligned integration scheme.</description><subject>Applied sciences</subject><subject>Atomic layer deposition</subject><subject>Bipolar transistors</subject><subject>Cutoff frequency</subject><subject>Electronics</subject><subject>Exact sciences and technology</subject><subject>Germanium silicon alloys</subject><subject>Heterojunction bipolar transistors</subject><subject>Laboratories</subject><subject>Nickel</subject><subject>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</subject><subject>Silicidation</subject><subject>Silicon germanium</subject><subject>Temperature</subject><subject>Transistors</subject><isbn>0780386841</isbn><isbn>9780780386846</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>2004</creationdate><recordtype>conference_proceeding</recordtype><sourceid>6IE</sourceid><recordid>eNpFj09Lw0AUxBdEUGs_QPGSi8fE9_Z_vGmsbaHFQ9tzeW7ewkoqJZuL395ABOcyh_kxzAixQKgQoX7aLN92lQTQFWqsUeKVuAPnQXnrNd6Iec5fMEobDV7disWOB-oKPqdh4L7YpxU_N8X69ZDvxXWkLvP8z2fi-L48NOty-7HaNC_bMqEyQ2kNOqkgtEyxtU57FyxGIhOkktraFnWMISBbAofkpAEPxBK0xPAZajUTj1PvhXKgLvb0HVI-Xfp0pv7nhON4q8GM3MPEJWb-j6eX6hcZFkRa</recordid><startdate>2004</startdate><enddate>2004</enddate><creator>Donkers, J.J.T.M.</creator><creator>Vanhoucke, T.</creator><creator>Agarwal, P.</creator><creator>Hueting, R.J.E.</creator><creator>Meunier-Beillard, P.</creator><creator>Vijayaraghavan, M.N.</creator><creator>Magnee, P.H.C.</creator><creator>Verheijen, M.A.</creator><creator>de Kort, R.</creator><creator>Slotboom, J.W.</creator><general>IEEE</general><scope>6IE</scope><scope>6IH</scope><scope>CBEJK</scope><scope>RIE</scope><scope>RIO</scope><scope>IQODW</scope></search><sort><creationdate>2004</creationdate><title>Metal emitter SiGe:C HBTs</title><author>Donkers, J.J.T.M. ; Vanhoucke, T. ; Agarwal, P. ; Hueting, R.J.E. ; Meunier-Beillard, P. ; Vijayaraghavan, M.N. ; Magnee, P.H.C. ; Verheijen, M.A. ; de Kort, R. ; Slotboom, J.W.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-i135t-6517230cdeafd67487c61faa5c232466d14ffcc1e6a071a725080ae20421cbc93</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>2004</creationdate><topic>Applied sciences</topic><topic>Atomic layer deposition</topic><topic>Bipolar transistors</topic><topic>Cutoff frequency</topic><topic>Electronics</topic><topic>Exact sciences and technology</topic><topic>Germanium silicon alloys</topic><topic>Heterojunction bipolar transistors</topic><topic>Laboratories</topic><topic>Nickel</topic><topic>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</topic><topic>Silicidation</topic><topic>Silicon germanium</topic><topic>Temperature</topic><topic>Transistors</topic><toplevel>online_resources</toplevel><creatorcontrib>Donkers, J.J.T.M.</creatorcontrib><creatorcontrib>Vanhoucke, T.</creatorcontrib><creatorcontrib>Agarwal, P.</creatorcontrib><creatorcontrib>Hueting, R.J.E.</creatorcontrib><creatorcontrib>Meunier-Beillard, P.</creatorcontrib><creatorcontrib>Vijayaraghavan, M.N.</creatorcontrib><creatorcontrib>Magnee, P.H.C.</creatorcontrib><creatorcontrib>Verheijen, M.A.</creatorcontrib><creatorcontrib>de Kort, R.</creatorcontrib><creatorcontrib>Slotboom, J.W.</creatorcontrib><collection>IEEE Electronic Library (IEL) Conference Proceedings</collection><collection>IEEE Proceedings Order Plan (POP) 1998-present by volume</collection><collection>IEEE Xplore All Conference Proceedings</collection><collection>IEEE/IET Electronic Library</collection><collection>IEEE Proceedings Order Plans (POP) 1998-present</collection><collection>Pascal-Francis</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Donkers, J.J.T.M.</au><au>Vanhoucke, T.</au><au>Agarwal, P.</au><au>Hueting, R.J.E.</au><au>Meunier-Beillard, P.</au><au>Vijayaraghavan, M.N.</au><au>Magnee, P.H.C.</au><au>Verheijen, M.A.</au><au>de Kort, R.</au><au>Slotboom, J.W.</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>Metal emitter SiGe:C HBTs</atitle><btitle>2004 International Electron Devices Meeting</btitle><stitle>IEDM</stitle><date>2004</date><risdate>2004</risdate><spage>243</spage><epage>246</epage><pages>243-246</pages><isbn>0780386841</isbn><isbn>9780780386846</isbn><abstract>SiGe:C heterojunction bipolar transistors (HBTs) offer high cut-off frequencies, f/sub T/, but low open base breakdown voltages, BV/sub CEO/, due to the relatively high current gain, h/sub FE/. In this paper, we show that the integration of a metal emitter, made by complete silicidation of a mono-emitter, increases the base current, I/sub B/ without reducing the collector current, I/sub C/. Hence, the BV/sub CEO/ is increased without affecting the f/sub T/. Furthermore, this metal emitter reduces the emitter series resistance, R/sub E/, and increases the f/sub T/ compared with a mono-emitter. SiGe:C HBTs with f/sub T/=230GHz and BV/sub CEO/=1.8V have been realised using a metal emitter in a self-aligned integration scheme.</abstract><cop>Piscataway NJ</cop><pub>IEEE</pub><doi>10.1109/IEDM.2004.1419121</doi><tpages>4</tpages></addata></record> |
fulltext | fulltext_linktorsrc |
identifier | ISBN: 0780386841 |
ispartof | 2004 International Electron Devices Meeting, 2004, p.243-246 |
issn | |
language | eng |
recordid | cdi_pascalfrancis_primary_17806405 |
source | IEEE Electronic Library (IEL) Conference Proceedings |
subjects | Applied sciences Atomic layer deposition Bipolar transistors Cutoff frequency Electronics Exact sciences and technology Germanium silicon alloys Heterojunction bipolar transistors Laboratories Nickel Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Silicidation Silicon germanium Temperature Transistors |
title | Metal emitter SiGe:C HBTs |
url | http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-06T05%3A33%3A12IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-pascalfrancis_6IE&rft_val_fmt=info:ofi/fmt:kev:mtx:book&rft.genre=proceeding&rft.atitle=Metal%20emitter%20SiGe:C%20HBTs&rft.btitle=2004%20International%20Electron%20Devices%20Meeting&rft.au=Donkers,%20J.J.T.M.&rft.date=2004&rft.spage=243&rft.epage=246&rft.pages=243-246&rft.isbn=0780386841&rft.isbn_list=9780780386846&rft_id=info:doi/10.1109/IEDM.2004.1419121&rft_dat=%3Cpascalfrancis_6IE%3E17806405%3C/pascalfrancis_6IE%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-i135t-6517230cdeafd67487c61faa5c232466d14ffcc1e6a071a725080ae20421cbc93%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_id=info:pmid/&rft_ieee_id=1419121&rfr_iscdi=true |