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Molybdenum-gate HfO2 CMOS FinFET technology

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Bibliographic Details
Main Authors: HA, Daewon, TAKEUCHI, H, CHOI, Y.-K, KING, T.-J, BAI, W. P, KWONG, D.-L, AGALWAL, A, AMEEN, M
Format: Conference Proceeding
Language:English
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