Loading…

A 100-W high-gain AlGaN/GaN HEMT power amplifier on a conductive n-SiC substrate for wireless base station applications

AlGaN/GaN high electron mobility transistors (HEMTs) were fabricated on a low-cost conductive n-SiC substrate. A single-chip GaN HEMT amplifier, operating at 60 V, achieved high CW output power of (101 W), a high linear gain (155 dB) and 50 % power-added efficiency at 2.14 GHz. This is the first rep...

Full description

Saved in:
Bibliographic Details
Main Authors: Kanamura, M., Kikkawa, T., Joshin, K.
Format: Conference Proceeding
Language:English
Subjects:
Online Access:Request full text
Tags: Add Tag
No Tags, Be the first to tag this record!
cited_by
cites
container_end_page 802
container_issue
container_start_page 799
container_title
container_volume
creator Kanamura, M.
Kikkawa, T.
Joshin, K.
description AlGaN/GaN high electron mobility transistors (HEMTs) were fabricated on a low-cost conductive n-SiC substrate. A single-chip GaN HEMT amplifier, operating at 60 V, achieved high CW output power of (101 W), a high linear gain (155 dB) and 50 % power-added efficiency at 2.14 GHz. This is the first report about the greater than 100 W power performance of the single-chip GaN HEMT that was grown on a conductive substrate.
doi_str_mv 10.1109/IEDM.2004.1419296
format conference_proceeding
fullrecord <record><control><sourceid>pascalfrancis_6IE</sourceid><recordid>TN_cdi_pascalfrancis_primary_17806533</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>1419296</ieee_id><sourcerecordid>17806533</sourcerecordid><originalsourceid>FETCH-LOGICAL-i135t-2920429fa835905443e8bc0bafc728867aafb4df0f556c0c378a256577193fc23</originalsourceid><addsrcrecordid>eNpFUMtKw0AUHRBBrf0AcTMbl0nvvJLJstTaFlpdWHFZbqYz7UiahJnU4t8breCFwz1wHotDyB2DlDEoRovp4yrlADJlkhW8yC7IDeQahM60ZFdkGOMH9CeVBC2uyWlMGUDyTvd-t0926Gs6rmb4POpB59PVmrbNyQaKh7byzvesqSlS09Tbo-n8p6V18uonNB7L2AXsLHVNoCcfbGVjpCVGS2OHnf-JtX2H-eXxllw6rKId_v0BeXuarifzZPkyW0zGy8QzobqEFxwkLxxqoQpQUgqrSwMlOpNzrbMc0ZVy68AplRkwItfIVabynBXCGS4G5OHc22I0WLmAtfFx0wZ_wPC1Yf00mRKi992ffd5a-y-fNxTf0xhlyQ</addsrcrecordid><sourcetype>Index Database</sourcetype><iscdi>true</iscdi><recordtype>conference_proceeding</recordtype></control><display><type>conference_proceeding</type><title>A 100-W high-gain AlGaN/GaN HEMT power amplifier on a conductive n-SiC substrate for wireless base station applications</title><source>IEEE Electronic Library (IEL) Conference Proceedings</source><creator>Kanamura, M. ; Kikkawa, T. ; Joshin, K.</creator><creatorcontrib>Kanamura, M. ; Kikkawa, T. ; Joshin, K.</creatorcontrib><description>AlGaN/GaN high electron mobility transistors (HEMTs) were fabricated on a low-cost conductive n-SiC substrate. A single-chip GaN HEMT amplifier, operating at 60 V, achieved high CW output power of (101 W), a high linear gain (155 dB) and 50 % power-added efficiency at 2.14 GHz. This is the first report about the greater than 100 W power performance of the single-chip GaN HEMT that was grown on a conductive substrate.</description><identifier>ISBN: 0780386841</identifier><identifier>ISBN: 9780780386846</identifier><identifier>DOI: 10.1109/IEDM.2004.1419296</identifier><language>eng</language><publisher>Piscataway NJ: IEEE</publisher><subject>Aluminum gallium nitride ; Amplifiers ; Applied sciences ; Base stations ; Circuit properties ; Electric, optical and optoelectronic circuits ; Electronic circuits ; Electronics ; Exact sciences and technology ; Gallium nitride ; HEMTs ; High power amplifiers ; Insulation ; Power generation ; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices ; Silicon carbide ; Substrates ; Thermal conductivity ; Transistors</subject><ispartof>IEDM Technical Digest. IEEE International Electron Devices Meeting, 2004, 2004, p.799-802</ispartof><rights>2006 INIST-CNRS</rights><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/1419296$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>309,310,780,784,789,790,2058,4050,4051,27925,54920</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/1419296$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&amp;idt=17806533$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Kanamura, M.</creatorcontrib><creatorcontrib>Kikkawa, T.</creatorcontrib><creatorcontrib>Joshin, K.</creatorcontrib><title>A 100-W high-gain AlGaN/GaN HEMT power amplifier on a conductive n-SiC substrate for wireless base station applications</title><title>IEDM Technical Digest. IEEE International Electron Devices Meeting, 2004</title><addtitle>IEDM</addtitle><description>AlGaN/GaN high electron mobility transistors (HEMTs) were fabricated on a low-cost conductive n-SiC substrate. A single-chip GaN HEMT amplifier, operating at 60 V, achieved high CW output power of (101 W), a high linear gain (155 dB) and 50 % power-added efficiency at 2.14 GHz. This is the first report about the greater than 100 W power performance of the single-chip GaN HEMT that was grown on a conductive substrate.</description><subject>Aluminum gallium nitride</subject><subject>Amplifiers</subject><subject>Applied sciences</subject><subject>Base stations</subject><subject>Circuit properties</subject><subject>Electric, optical and optoelectronic circuits</subject><subject>Electronic circuits</subject><subject>Electronics</subject><subject>Exact sciences and technology</subject><subject>Gallium nitride</subject><subject>HEMTs</subject><subject>High power amplifiers</subject><subject>Insulation</subject><subject>Power generation</subject><subject>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</subject><subject>Silicon carbide</subject><subject>Substrates</subject><subject>Thermal conductivity</subject><subject>Transistors</subject><isbn>0780386841</isbn><isbn>9780780386846</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>2004</creationdate><recordtype>conference_proceeding</recordtype><sourceid>6IE</sourceid><recordid>eNpFUMtKw0AUHRBBrf0AcTMbl0nvvJLJstTaFlpdWHFZbqYz7UiahJnU4t8breCFwz1wHotDyB2DlDEoRovp4yrlADJlkhW8yC7IDeQahM60ZFdkGOMH9CeVBC2uyWlMGUDyTvd-t0926Gs6rmb4POpB59PVmrbNyQaKh7byzvesqSlS09Tbo-n8p6V18uonNB7L2AXsLHVNoCcfbGVjpCVGS2OHnf-JtX2H-eXxllw6rKId_v0BeXuarifzZPkyW0zGy8QzobqEFxwkLxxqoQpQUgqrSwMlOpNzrbMc0ZVy68AplRkwItfIVabynBXCGS4G5OHc22I0WLmAtfFx0wZ_wPC1Yf00mRKi992ffd5a-y-fNxTf0xhlyQ</recordid><startdate>2004</startdate><enddate>2004</enddate><creator>Kanamura, M.</creator><creator>Kikkawa, T.</creator><creator>Joshin, K.</creator><general>IEEE</general><scope>6IE</scope><scope>6IH</scope><scope>CBEJK</scope><scope>RIE</scope><scope>RIO</scope><scope>IQODW</scope></search><sort><creationdate>2004</creationdate><title>A 100-W high-gain AlGaN/GaN HEMT power amplifier on a conductive n-SiC substrate for wireless base station applications</title><author>Kanamura, M. ; Kikkawa, T. ; Joshin, K.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-i135t-2920429fa835905443e8bc0bafc728867aafb4df0f556c0c378a256577193fc23</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>2004</creationdate><topic>Aluminum gallium nitride</topic><topic>Amplifiers</topic><topic>Applied sciences</topic><topic>Base stations</topic><topic>Circuit properties</topic><topic>Electric, optical and optoelectronic circuits</topic><topic>Electronic circuits</topic><topic>Electronics</topic><topic>Exact sciences and technology</topic><topic>Gallium nitride</topic><topic>HEMTs</topic><topic>High power amplifiers</topic><topic>Insulation</topic><topic>Power generation</topic><topic>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</topic><topic>Silicon carbide</topic><topic>Substrates</topic><topic>Thermal conductivity</topic><topic>Transistors</topic><toplevel>online_resources</toplevel><creatorcontrib>Kanamura, M.</creatorcontrib><creatorcontrib>Kikkawa, T.</creatorcontrib><creatorcontrib>Joshin, K.</creatorcontrib><collection>IEEE Electronic Library (IEL) Conference Proceedings</collection><collection>IEEE Proceedings Order Plan (POP) 1998-present by volume</collection><collection>IEEE Xplore All Conference Proceedings</collection><collection>IEEE Xplore (Online service)</collection><collection>IEEE Proceedings Order Plans (POP) 1998-present</collection><collection>Pascal-Francis</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Kanamura, M.</au><au>Kikkawa, T.</au><au>Joshin, K.</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>A 100-W high-gain AlGaN/GaN HEMT power amplifier on a conductive n-SiC substrate for wireless base station applications</atitle><btitle>IEDM Technical Digest. IEEE International Electron Devices Meeting, 2004</btitle><stitle>IEDM</stitle><date>2004</date><risdate>2004</risdate><spage>799</spage><epage>802</epage><pages>799-802</pages><isbn>0780386841</isbn><isbn>9780780386846</isbn><abstract>AlGaN/GaN high electron mobility transistors (HEMTs) were fabricated on a low-cost conductive n-SiC substrate. A single-chip GaN HEMT amplifier, operating at 60 V, achieved high CW output power of (101 W), a high linear gain (155 dB) and 50 % power-added efficiency at 2.14 GHz. This is the first report about the greater than 100 W power performance of the single-chip GaN HEMT that was grown on a conductive substrate.</abstract><cop>Piscataway NJ</cop><pub>IEEE</pub><doi>10.1109/IEDM.2004.1419296</doi><tpages>4</tpages></addata></record>
fulltext fulltext_linktorsrc
identifier ISBN: 0780386841
ispartof IEDM Technical Digest. IEEE International Electron Devices Meeting, 2004, 2004, p.799-802
issn
language eng
recordid cdi_pascalfrancis_primary_17806533
source IEEE Electronic Library (IEL) Conference Proceedings
subjects Aluminum gallium nitride
Amplifiers
Applied sciences
Base stations
Circuit properties
Electric, optical and optoelectronic circuits
Electronic circuits
Electronics
Exact sciences and technology
Gallium nitride
HEMTs
High power amplifiers
Insulation
Power generation
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Silicon carbide
Substrates
Thermal conductivity
Transistors
title A 100-W high-gain AlGaN/GaN HEMT power amplifier on a conductive n-SiC substrate for wireless base station applications
url http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-27T11%3A05%3A07IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-pascalfrancis_6IE&rft_val_fmt=info:ofi/fmt:kev:mtx:book&rft.genre=proceeding&rft.atitle=A%20100-W%20high-gain%20AlGaN/GaN%20HEMT%20power%20amplifier%20on%20a%20conductive%20n-SiC%20substrate%20for%20wireless%20base%20station%20applications&rft.btitle=IEDM%20Technical%20Digest.%20IEEE%20International%20Electron%20Devices%20Meeting,%202004&rft.au=Kanamura,%20M.&rft.date=2004&rft.spage=799&rft.epage=802&rft.pages=799-802&rft.isbn=0780386841&rft.isbn_list=9780780386846&rft_id=info:doi/10.1109/IEDM.2004.1419296&rft_dat=%3Cpascalfrancis_6IE%3E17806533%3C/pascalfrancis_6IE%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-i135t-2920429fa835905443e8bc0bafc728867aafb4df0f556c0c378a256577193fc23%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_id=info:pmid/&rft_ieee_id=1419296&rfr_iscdi=true