Multidirectional UV Lithography for Complex 3-D MEMS Structures

Various three-dimensionally (3-D) complex MEMS structures are fabricated using multidirectional ultraviolet (UV) lithography, which includes reverse-side exposure through a UV-transparent substrate, inclined exposure with or without simultaneous substrate rotation, and the combination of these proce...

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Bibliographic Details
Published in:Journal of microelectromechanical systems 2006-10, Vol.15 (5), p.1121-1130
Main Authors: Yong-Kyu Yoon, Jung-Hwan Park, Allen, M.G.
Format: Article
Language:English
Subjects:
Barium strontium titanates
Binary search trees
Dynamics
Exact sciences and technology
Glass
Inclined exposure
Instruments, apparatus, components and techniques common to several branches of physics and astronomy
Integrated optics
Lenses
Lithography
Mechanical instruments, equipment and techniques
Metallization
Metallizing
Microelectromechanical systems
Micromechanical devices
Micromechanical devices and systems
multidirectional ultraviolet (UV) lithography
Optical refraction
Optical variables control
Patterning
Physics
Resists
reverse-side exposure
rotational exposure
Sapphire
SU-8
Ultraviolet
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Summary:Various three-dimensionally (3-D) complex MEMS structures are fabricated using multidirectional ultraviolet (UV) lithography, which includes reverse-side exposure through a UV-transparent substrate, inclined exposure with or without simultaneous substrate rotation, and the combination of these processes. A reverse-side exposure scheme through UV-transparent substrates (e.g., glass, sapphire, or quartz) has been exploited for implementing high-aspect-ratio structures (greater than 20:1), repeatable self-alignment photoresist patterning with subsequent metallization on a BST/sapphire substrate, and unconventional patterning using substrate optics such as proximity patterning or integrated lens techniques. Inclined exposure has been applied to a SU-8 substrate with differing inclination angles and incidence directions. The refractive index of SU-8 is experimentally determined to be 1.68 by means of test structures fabricated using this approach. Implemented structures using the inclined exposure include vertical screen structures, inclined tubes, and conical shape structures. Dynamic mode operation, in which the substrate is continuously rotated and tilted during exposure is also discussed. Examples of achievable 3-D structures using dynamic mode operation are presented
ISSN:1057-7157
1941-0158
DOI:10.1109/JMEMS.2006.879669