Optimization of RF plasma sources for the MBE growth of nitride and dilute nitride semiconductor material

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Bibliographic Details
Published in:Semiconductor science and technology 2007-02, Vol.22 (2), p.15-19
Main Authors: Grant, V A, Campion, R P, Foxon, C T, Lu, W, Chao, S, Larkins, E C
Format: Article
Language:English
Subjects:
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Molecular, atomic, ion, and chemical beam epitaxy
Physics
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ISSN:0268-1242
1361-6641
DOI:10.1088/0268-1242/22/2/003