Focused ion beam fabrication procedures of x-ray micro Fresnel zone plates

In this paper the use of focused ion beam (FIB) mask-less lithography is presented as a novel and simple way to fabricate x-ray Fresnel zone plates (FZPs), and a prototype of a FIB-made 100 nm resolution FZP with 38 zones is described. Considerations for future developments-the maximum aspect ratio...

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Bibliographic Details
Published in:Journal of micromechanics and microengineering 2007-03, Vol.17 (3), p.617-622
Main Authors: Surpi, A, Valizadeh, S, Leifer, K, Lagomarsino, S
Format: Article
Language:English
Subjects:
Applied sciences
Electronics
Exact sciences and technology
Fysik
Instruments, apparatus, components and techniques common to several branches of physics and astronomy
Mechanical engineering. Machine design
Mechanical instruments, equipment and techniques
Microelectronic fabrication (materials and surfaces technology)
Micromechanical devices and systems
NATURAL SCIENCES
NATURVETENSKAP
Physics
Precision engineering, watch making
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
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Description
Summary:In this paper the use of focused ion beam (FIB) mask-less lithography is presented as a novel and simple way to fabricate x-ray Fresnel zone plates (FZPs), and a prototype of a FIB-made 100 nm resolution FZP with 38 zones is described. Considerations for future developments-the maximum aspect ratio achievable by FIB lithography in nickel, a way to produce zones with a parabolic transverse profile, as theoretically required for the highest efficiency in focusing-are also reported.
ISSN:0960-1317
1361-6439
1361-6439
DOI:10.1088/0960-1317/17/3/026