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High performance III/V RTD and PIN diode on a silicon (001) substrate: From surface science to nanoscale devices

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Published in:	Applied physics. A, Materials science & processing Materials science & processing, 2007, Vol.87 (3), p.539-544
Main Authors:	PROST, W, KHORENKO, V, MOFOR, A.-C, NEUMANN, S, POLOCZEK, A, MATISS, A, BAKIN, A, SCHLACHETZKI, A, TEGUDE, F.-J
Format:	Article
Language:	English
Subjects:	Applied sciences Circuit properties Compound structure devices Diodes Electric, optical and optoelectronic circuits Electronics Exact sciences and technology Integrated optics. Optical fibers and wave guides Optical and optoelectronic circuits Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
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creator	PROST, W KHORENKO, V MOFOR, A.-C NEUMANN, S POLOCZEK, A MATISS, A BAKIN, A SCHLACHETZKI, A TEGUDE, F.-J
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source	Springer Nature
subjects	Applied sciences Circuit properties Compound structure devices Diodes Electric, optical and optoelectronic circuits Electronics Exact sciences and technology Integrated optics. Optical fibers and wave guides Optical and optoelectronic circuits Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
title	High performance III/V RTD and PIN diode on a silicon (001) substrate: From surface science to nanoscale devices
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