Loading…
On the low-frequency noise of pmosfets with eMOSFETs SiGe Source/Drain and fully silicided metal gate
Saved in:
Published in: | IEEE electron device letters 2007, Vol.28 (11), p.987-989 |
---|---|
Main Authors: | , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Online Access: | Get full text |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
cited_by | |
---|---|
cites | |
container_end_page | 989 |
container_issue | 11 |
container_start_page | 987 |
container_title | IEEE electron device letters |
container_volume | 28 |
creator | SIMOEN, E VERHEYEN, P SHICKOVA, A LOO, R CLAEYS, C MEMBER, Senior |
description | |
format | article |
fullrecord | <record><control><sourceid>pascalfrancis</sourceid><recordid>TN_cdi_pascalfrancis_primary_19194276</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>19194276</sourcerecordid><originalsourceid>FETCH-pascalfrancis_primary_191942763</originalsourceid><addsrcrecordid>eNqNzL9OwzAQgHELgUSAvsMtjBE2cRI683dBHdK9Ojnn9pBjB5-jKm8PAw_A9C0_fReqMm37VOu2ay5VpXtr6sbo7lrdiHxpbaztbaVoF6GcCEI61z7T90LRrRATC0HyME9JPBWBM5cT0OdueHvdCwz8TjCkJTt6eMnIETCO4JcQVhAO7HikESYqGOCIhe7UlccgtPnrrbr__Tx_1DOKw-AzRsdymDNPmNeD2Zqtfey75r_uBzNjSRk</addsrcrecordid><sourcetype>Index Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>On the low-frequency noise of pmosfets with eMOSFETs SiGe Source/Drain and fully silicided metal gate</title><source>IEEE Electronic Library (IEL) Journals</source><creator>SIMOEN, E ; VERHEYEN, P ; SHICKOVA, A ; LOO, R ; CLAEYS, C ; MEMBER, Senior</creator><creatorcontrib>SIMOEN, E ; VERHEYEN, P ; SHICKOVA, A ; LOO, R ; CLAEYS, C ; MEMBER, Senior</creatorcontrib><identifier>ISSN: 0741-3106</identifier><identifier>EISSN: 1558-0563</identifier><identifier>CODEN: EDLEDZ</identifier><language>eng</language><publisher>New York, NY: Institute of Electrical and Electronics Engineers</publisher><subject>Applied sciences ; Electronics ; Exact sciences and technology ; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices ; Transistors</subject><ispartof>IEEE electron device letters, 2007, Vol.28 (11), p.987-989</ispartof><rights>2007 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,4024</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=19194276$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>SIMOEN, E</creatorcontrib><creatorcontrib>VERHEYEN, P</creatorcontrib><creatorcontrib>SHICKOVA, A</creatorcontrib><creatorcontrib>LOO, R</creatorcontrib><creatorcontrib>CLAEYS, C</creatorcontrib><creatorcontrib>MEMBER, Senior</creatorcontrib><title>On the low-frequency noise of pmosfets with eMOSFETs SiGe Source/Drain and fully silicided metal gate</title><title>IEEE electron device letters</title><subject>Applied sciences</subject><subject>Electronics</subject><subject>Exact sciences and technology</subject><subject>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</subject><subject>Transistors</subject><issn>0741-3106</issn><issn>1558-0563</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2007</creationdate><recordtype>article</recordtype><recordid>eNqNzL9OwzAQgHELgUSAvsMtjBE2cRI683dBHdK9Ojnn9pBjB5-jKm8PAw_A9C0_fReqMm37VOu2ay5VpXtr6sbo7lrdiHxpbaztbaVoF6GcCEI61z7T90LRrRATC0HyME9JPBWBM5cT0OdueHvdCwz8TjCkJTt6eMnIETCO4JcQVhAO7HikESYqGOCIhe7UlccgtPnrrbr__Tx_1DOKw-AzRsdymDNPmNeD2Zqtfey75r_uBzNjSRk</recordid><startdate>2007</startdate><enddate>2007</enddate><creator>SIMOEN, E</creator><creator>VERHEYEN, P</creator><creator>SHICKOVA, A</creator><creator>LOO, R</creator><creator>CLAEYS, C</creator><creator>MEMBER, Senior</creator><general>Institute of Electrical and Electronics Engineers</general><scope>IQODW</scope></search><sort><creationdate>2007</creationdate><title>On the low-frequency noise of pmosfets with eMOSFETs SiGe Source/Drain and fully silicided metal gate</title><author>SIMOEN, E ; VERHEYEN, P ; SHICKOVA, A ; LOO, R ; CLAEYS, C ; MEMBER, Senior</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-pascalfrancis_primary_191942763</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2007</creationdate><topic>Applied sciences</topic><topic>Electronics</topic><topic>Exact sciences and technology</topic><topic>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</topic><topic>Transistors</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>SIMOEN, E</creatorcontrib><creatorcontrib>VERHEYEN, P</creatorcontrib><creatorcontrib>SHICKOVA, A</creatorcontrib><creatorcontrib>LOO, R</creatorcontrib><creatorcontrib>CLAEYS, C</creatorcontrib><creatorcontrib>MEMBER, Senior</creatorcontrib><collection>Pascal-Francis</collection><jtitle>IEEE electron device letters</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>SIMOEN, E</au><au>VERHEYEN, P</au><au>SHICKOVA, A</au><au>LOO, R</au><au>CLAEYS, C</au><au>MEMBER, Senior</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>On the low-frequency noise of pmosfets with eMOSFETs SiGe Source/Drain and fully silicided metal gate</atitle><jtitle>IEEE electron device letters</jtitle><date>2007</date><risdate>2007</risdate><volume>28</volume><issue>11</issue><spage>987</spage><epage>989</epage><pages>987-989</pages><issn>0741-3106</issn><eissn>1558-0563</eissn><coden>EDLEDZ</coden><cop>New York, NY</cop><pub>Institute of Electrical and Electronics Engineers</pub></addata></record> |
fulltext | fulltext |
identifier | ISSN: 0741-3106 |
ispartof | IEEE electron device letters, 2007, Vol.28 (11), p.987-989 |
issn | 0741-3106 1558-0563 |
language | eng |
recordid | cdi_pascalfrancis_primary_19194276 |
source | IEEE Electronic Library (IEL) Journals |
subjects | Applied sciences Electronics Exact sciences and technology Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Transistors |
title | On the low-frequency noise of pmosfets with eMOSFETs SiGe Source/Drain and fully silicided metal gate |
url | http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-26T21%3A05%3A43IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-pascalfrancis&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=On%20the%20low-frequency%20noise%20of%20pmosfets%20with%20eMOSFETs%20SiGe%20Source/Drain%20and%20fully%20silicided%20metal%20gate&rft.jtitle=IEEE%20electron%20device%20letters&rft.au=SIMOEN,%20E&rft.date=2007&rft.volume=28&rft.issue=11&rft.spage=987&rft.epage=989&rft.pages=987-989&rft.issn=0741-3106&rft.eissn=1558-0563&rft.coden=EDLEDZ&rft_id=info:doi/&rft_dat=%3Cpascalfrancis%3E19194276%3C/pascalfrancis%3E%3Cgrp_id%3Ecdi_FETCH-pascalfrancis_primary_191942763%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |