Spatial distribution of SiH3 radicals in RF silane plasma

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Bibliographic Details
Published in:Japanese journal of applied physics 1990-03, Vol.29 (3), p.L505-L507
Main Authors: ITABASHI, N, NISHIWAKI, N, MAGANE, M, NAITO, S, GOTO, T, MATSUDA, A, YAMADA, C, HIROTA, E
Format: Article
Language:English
Subjects:
Exact sciences and technology
Physics
Physics of gases, plasmas and electric discharges
Physics of plasmas and electric discharges
Plasma devices
Online Access:Get full text
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ISSN:0021-4922
1347-4065
DOI:10.1143/jjap.29.l505