Characterization of neutral beam source using dc cold cathode discharge and its application processes : Neutral Beam Processes

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Bibliographic Details
Published in:Journal of physics. D, Applied physics Applied physics, 2008, Vol.41 (2)
Main Authors: ICHIKI, Katsunori, HATAKEYAMA, Masahiro
Format: Article
Language:English
Subjects:
Etching and cleaning
Exact sciences and technology
Physics
Physics of gases, plasmas and electric discharges
Physics of plasmas and electric discharges
Plasma applications
Online Access:Get full text
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ISSN:0022-3727
1361-6463