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Experimental Results of on-State Resistance Reduction by STI Fingers in LDMOSFET

This letter demonstrates a successful method for on-state resistance reduction up to 20% by shallow trench isolation (STI) fingers and with extra NLDD implant in the fingered region simultaneously for medium power devices. This fingered region provides a multidimensional electric field that avoids M...

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Bibliographic Details
Published in:IEEE electron device letters 2009-02, Vol.30 (2), p.192-194
Main Authors: Ru-Yi Su, Chiang, P.Y., Jeng Gong, Tsung-Yi Huang, Tsai, C.L., Chou, C.C., Liu, C.M.
Format: Article
Language:English
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Summary:This letter demonstrates a successful method for on-state resistance reduction up to 20% by shallow trench isolation (STI) fingers and with extra NLDD implant in the fingered region simultaneously for medium power devices. This fingered region provides a multidimensional electric field that avoids MOSFET breakdown voltage decrease, and it also shortens the drain-current conduction path. Therefore, low on-state resistance and high drain driving current is obtained in our proposed device. Careful design for structural parameters of this STI finger is needed to achieve the optimum R ON performance without hurting breakdown voltage.
ISSN:0741-3106
1558-0563
DOI:10.1109/LED.2008.2010565