Surface reaction kinetics of CH3 in CH4 RF discharge studied by time-resolved threshold ionization mass spectrometry

Saved in:
Bibliographic Details
Published in:Japanese journal of applied physics 1997-07, Vol.36 (7B), p.4752-4755
Main Authors: SHIRATANI, M, JOLLY, J, VIDELOT, H, PERRIN, J
Format: Article
Language:English
Subjects:
Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
Cross-disciplinary physics: materials science
rheology
Electric discharges
Exact sciences and technology
Instruments, apparatus, components and techniques common to several branches of physics and astronomy
Mass spectrometers and related techniques
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Physics
Physics of gases, plasmas and electric discharges
Physics of plasmas and electric discharges
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:
ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.36.4752