SiO2 and Si nanoscale patterning with an atomic force microscope

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Bibliographic Details
Published in:Superlattices and microstructures 1998, Vol.23 (2), p.441-444
Main Authors: KLEHN, B, KUNZE, U
Format: Article
Language:English
Subjects:
Applied sciences
Electronics
Exact sciences and technology
Microelectronic fabrication (materials and surfaces technology)
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Online Access:Get full text
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ISSN:0749-6036
1096-3677
DOI:10.1006/spmi.1996.0358