Effect of electron magnetic trapping in a plasma immersion ion implantation system: Carbon-free SiOx films deposited from octamethylcyclotetrasiloxane

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Bibliographic Details
Published in:The European physical journal. D, Atomic, molecular, and optical physics Atomic, molecular, and optical physics, 2009, Vol.54 (2), p.205-209
Main Authors: KOSTOV, K. G, ALGATTI, M. A, PILLACA, E. J. D. M, KAYAMA, M. E, MOTA, R. P, HONDA, R. Y
Format: Article
Language:English
Subjects:
Exact sciences and technology
Ionization of plasmas
Magnetic confinement and equilibrium
Magnetic mirrors
Physics
Physics of gases, plasmas and electric discharges
Physics of plasmas and electric discharges
Plasma applications
Plasma properties
Plasma-based ion implantation and deposition
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ISSN:1434-6060
1434-6079