Design optimization of gate-silicided ESD NMOSFETs in a 45 nm bulk CMOS technology : Electrostatic Discharge Reliability

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Bibliographic Details
Main Authors: ALVAREZ, David, CHATTY, Kiran, RUSS, Christian, ABOU-KHALIL, Michel J, JUNJUN LI, GAUTHIER, Robert, ESMARK, Kai, HALBACH, Ralph, SEGUIN, Christopher
Format: Conference Proceeding
Language:English
Subjects:
Applied sciences
Design. Technologies. Operation analysis. Testing
Electronics
Exact sciences and technology
Integrated circuits
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Testing, measurement, noise and reliability
Transistors
Online Access:Get full text
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ISSN:0026-2714
1872-941X