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Laser-induced fluorescence measurements of absolute sih densities in SiH4-H2 RF discharges and comparison with a numerical model

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Bibliographic Details
Published in:	Plasma sources science & technology 1998-05, Vol.7 (2), p.130-135
Main Authors:	HERTL, M, DORVAL, N, LEROY, O, JOLLY, J, PEALAT, M
Format:	Article
Language:	English
Subjects:	Biological and medical applications Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Cross-disciplinary physics: materials science rheology Exact sciences and technology Fundamental areas of phenomenology (including applications) Laser applications Mass and density Materials science Measurements common to several branches of physics and astronomy Methods of deposition of films and coatings film growth and epitaxy Metrology, measurements and laboratory procedures Optics Physics
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