Characterization of N-doped TiO2 films prepared by reactive sputtering using air/Ar mixtures

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Bibliographic Details
Published in:Thin solid films 2010, Vol.518 (5), p.1369-1372
Main Authors: CHAN, Mu-Hsuan, LU, Fu-Hsing
Format: Article
Language:English
Subjects:
Catalysis
Catalysts: preparations and properties
Chemistry
Condensed matter: electronic structure, electrical, magnetic, and optical properties
Cross-disciplinary physics: materials science
rheology
Deposition by sputtering
Exact sciences and technology
General and physical chemistry
General, apparatus
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation
Optical properties of specific thin films
Physics
Surface physical chemistry
Theory of reactions, general kinetics. Catalysis. Nomenclature, chemical documentation, computer chemistry
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ISSN:0040-6090
1879-2731