Loading…
Characterization of N-doped TiO2 films prepared by reactive sputtering using air/Ar mixtures
Saved in:
| Published in: | Thin solid films 2010, Vol.518 (5), p.1369-1372 |
|---|---|
| Main Authors: | , |
| Format: | Article |
| Language: | English |
| Subjects: | |
| Online Access: | Get full text |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
| cited_by | |
|---|---|
| cites | |
| container_end_page | 1372 |
| container_issue | 5 |
| container_start_page | 1369 |
| container_title | Thin solid films |
| container_volume | 518 |
| creator | CHAN, Mu-Hsuan LU, Fu-Hsing |
| description | |
| format | article |
| fullrecord | <record><control><sourceid>pascalfrancis</sourceid><recordid>TN_cdi_pascalfrancis_primary_22472375</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>22472375</sourcerecordid><originalsourceid>FETCH-pascalfrancis_primary_224723753</originalsourceid><addsrcrecordid>eNqNi7sKwkAQRRdRMD7-YRrL4GYTjSlFFCttUgoyxo2O5LHMJKJ-vQp-gM25cLino7xgESe-icOgqzytI-3PdaL7aiBy01oHxoSeOqyuyJg1lumFDdUV1Dns_HPt7BlS2hvIqSgFHFuH_HGnJ7D9BHS3IK5tvmV1gVa-ROLpkqGkR9OylZHq5ViIHf92qCabdbra-g4lwyJnrDKSo2MqkZ9HY6LYhPEs_Pf3BurgRqs</addsrcrecordid><sourcetype>Index Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Characterization of N-doped TiO2 films prepared by reactive sputtering using air/Ar mixtures</title><source>ScienceDirect Freedom Collection 2022-2024</source><creator>CHAN, Mu-Hsuan ; LU, Fu-Hsing</creator><creatorcontrib>CHAN, Mu-Hsuan ; LU, Fu-Hsing</creatorcontrib><identifier>ISSN: 0040-6090</identifier><identifier>EISSN: 1879-2731</identifier><identifier>CODEN: THSFAP</identifier><language>eng</language><publisher>Amsterdam: Elsevier</publisher><subject>Catalysis ; Catalysts: preparations and properties ; Chemistry ; Condensed matter: electronic structure, electrical, magnetic, and optical properties ; Cross-disciplinary physics: materials science; rheology ; Deposition by sputtering ; Exact sciences and technology ; General and physical chemistry ; General, apparatus ; Materials science ; Methods of deposition of films and coatings; film growth and epitaxy ; Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation ; Optical properties of specific thin films ; Physics ; Surface physical chemistry ; Theory of reactions, general kinetics. Catalysis. Nomenclature, chemical documentation, computer chemistry</subject><ispartof>Thin solid films, 2010, Vol.518 (5), p.1369-1372</ispartof><rights>2015 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780,4009</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=22472375$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>CHAN, Mu-Hsuan</creatorcontrib><creatorcontrib>LU, Fu-Hsing</creatorcontrib><title>Characterization of N-doped TiO2 films prepared by reactive sputtering using air/Ar mixtures</title><title>Thin solid films</title><subject>Catalysis</subject><subject>Catalysts: preparations and properties</subject><subject>Chemistry</subject><subject>Condensed matter: electronic structure, electrical, magnetic, and optical properties</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Deposition by sputtering</subject><subject>Exact sciences and technology</subject><subject>General and physical chemistry</subject><subject>General, apparatus</subject><subject>Materials science</subject><subject>Methods of deposition of films and coatings; film growth and epitaxy</subject><subject>Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation</subject><subject>Optical properties of specific thin films</subject><subject>Physics</subject><subject>Surface physical chemistry</subject><subject>Theory of reactions, general kinetics. Catalysis. Nomenclature, chemical documentation, computer chemistry</subject><issn>0040-6090</issn><issn>1879-2731</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2010</creationdate><recordtype>article</recordtype><recordid>eNqNi7sKwkAQRRdRMD7-YRrL4GYTjSlFFCttUgoyxo2O5LHMJKJ-vQp-gM25cLino7xgESe-icOgqzytI-3PdaL7aiBy01oHxoSeOqyuyJg1lumFDdUV1Dns_HPt7BlS2hvIqSgFHFuH_HGnJ7D9BHS3IK5tvmV1gVa-ROLpkqGkR9OylZHq5ViIHf92qCabdbra-g4lwyJnrDKSo2MqkZ9HY6LYhPEs_Pf3BurgRqs</recordid><startdate>2010</startdate><enddate>2010</enddate><creator>CHAN, Mu-Hsuan</creator><creator>LU, Fu-Hsing</creator><general>Elsevier</general><scope>IQODW</scope></search><sort><creationdate>2010</creationdate><title>Characterization of N-doped TiO2 films prepared by reactive sputtering using air/Ar mixtures</title><author>CHAN, Mu-Hsuan ; LU, Fu-Hsing</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-pascalfrancis_primary_224723753</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2010</creationdate><topic>Catalysis</topic><topic>Catalysts: preparations and properties</topic><topic>Chemistry</topic><topic>Condensed matter: electronic structure, electrical, magnetic, and optical properties</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Deposition by sputtering</topic><topic>Exact sciences and technology</topic><topic>General and physical chemistry</topic><topic>General, apparatus</topic><topic>Materials science</topic><topic>Methods of deposition of films and coatings; film growth and epitaxy</topic><topic>Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation</topic><topic>Optical properties of specific thin films</topic><topic>Physics</topic><topic>Surface physical chemistry</topic><topic>Theory of reactions, general kinetics. Catalysis. Nomenclature, chemical documentation, computer chemistry</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>CHAN, Mu-Hsuan</creatorcontrib><creatorcontrib>LU, Fu-Hsing</creatorcontrib><collection>Pascal-Francis</collection><jtitle>Thin solid films</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>CHAN, Mu-Hsuan</au><au>LU, Fu-Hsing</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Characterization of N-doped TiO2 films prepared by reactive sputtering using air/Ar mixtures</atitle><jtitle>Thin solid films</jtitle><date>2010</date><risdate>2010</risdate><volume>518</volume><issue>5</issue><spage>1369</spage><epage>1372</epage><pages>1369-1372</pages><issn>0040-6090</issn><eissn>1879-2731</eissn><coden>THSFAP</coden><cop>Amsterdam</cop><pub>Elsevier</pub></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 0040-6090 |
| ispartof | Thin solid films, 2010, Vol.518 (5), p.1369-1372 |
| issn | 0040-6090 1879-2731 |
| language | eng |
| recordid | cdi_pascalfrancis_primary_22472375 |
| source | ScienceDirect Freedom Collection 2022-2024 |
| subjects | Catalysis Catalysts: preparations and properties Chemistry Condensed matter: electronic structure, electrical, magnetic, and optical properties Cross-disciplinary physics: materials science rheology Deposition by sputtering Exact sciences and technology General and physical chemistry General, apparatus Materials science Methods of deposition of films and coatings film growth and epitaxy Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation Optical properties of specific thin films Physics Surface physical chemistry Theory of reactions, general kinetics. Catalysis. Nomenclature, chemical documentation, computer chemistry |
| title | Characterization of N-doped TiO2 films prepared by reactive sputtering using air/Ar mixtures |
| url | http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-24T10%3A09%3A05IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-pascalfrancis&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Characterization%20of%20N-doped%20TiO2%20films%20prepared%20by%20reactive%20sputtering%20using%20air/Ar%20mixtures&rft.jtitle=Thin%20solid%20films&rft.au=CHAN,%20Mu-Hsuan&rft.date=2010&rft.volume=518&rft.issue=5&rft.spage=1369&rft.epage=1372&rft.pages=1369-1372&rft.issn=0040-6090&rft.eissn=1879-2731&rft.coden=THSFAP&rft_id=info:doi/&rft_dat=%3Cpascalfrancis%3E22472375%3C/pascalfrancis%3E%3Cgrp_id%3Ecdi_FETCH-pascalfrancis_primary_224723753%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |