Study of SF6 and SF6/O2 plasmas in a hollow cathode reactive ion etching reactor using Langmuir probe and optical emission spectroscopy techniques

In this work, electrical and optical studies of SF6 and SF6/O2 plasmas generated in a hollow cathode reactive ion etching reactor were performed using the Langmuir probe and optical emission spectroscopy techniques, respectively. We carried out an investigation aimed at understanding the influence o...

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Bibliographic Details
Published in:Plasma sources science & technology 2010-04, Vol.19 (2), p.025013-025013
Main Authors: Pessoa, R S, Tezani, L L, Maciel, H S, Petraconi, G, Massi, M
Format: Article
Language:English
Subjects:
Density
Electric and magnetic measurements
Electron density
Electronegativity
Exact sciences and technology
Fluorine
Hollow cathodes
Optical (ultraviolet, visible, infrared) measurements
Optical emission spectroscopy
Physics
Physics of gases, plasmas and electric discharges
Physics of plasmas and electric discharges
Plasma diagnostic techniques and instrumentation
Plasmas
Reactive ion etching
Reactors
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Summary:In this work, electrical and optical studies of SF6 and SF6/O2 plasmas generated in a hollow cathode reactive ion etching reactor were performed using the Langmuir probe and optical emission spectroscopy techniques, respectively. We carried out an investigation aimed at understanding the influence of radio-frequency power, gas pressure and O2 gas mixing ratio on plasma parameters, namely electron temperature, electron density and electronegativity, and also atomic fluorine density. The results indicate an increase of up to one order of magnitude in electron density and atomic fluorine in the overall gas volume when compared with a conventional reactive ion etching plasma generated under the same operation conditions.
ISSN:0963-0252
1361-6595
DOI:10.1088/0963-0252/19/2/025013