172 nm pre-treatment for PDMS/PDMS replication

Preparation of a micro-zipper for component assembly requires an efficient anti-sticking layer between the two counterparts during preparation by moulding and during operation as well. In order to deposit a fluorinated silane on the PDMS-type materials used for zipper preparation, a UV-ozone pre-tre...

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Bibliographic Details
Published in:Microelectronic engineering 2010-05, Vol.87 (5), p.1519-1521
Main Authors: Möllenbeck, S., Bogdanski, N., Mayer, A., Scheer, H.-C., Zajadacz, J., Zimmer, K.
Format: Article
Language:English
Subjects:
Anti-sticking layer
Condensed matter: structure, mechanical and thermal properties
Exact sciences and technology
Micro-zipper
Nanocrystalline materials
PDMS
Physics
Radiation effects on specific materials
Structure of solids and liquids
crystallography
Undercuts structures
UV-radiation
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Summary:Preparation of a micro-zipper for component assembly requires an efficient anti-sticking layer between the two counterparts during preparation by moulding and during operation as well. In order to deposit a fluorinated silane on the PDMS-type materials used for zipper preparation, a UV-ozone pre-treatment at 172 nm was investigated in detail. It was found that already at 2 min of irradiation the surface features a sufficient amount of OH-groups for silane binding. Longer irradiation times were found to result in a surface layer of increasing brittleness that would prevent successful zipper operation.
ISSN:0167-9317
1873-5568
DOI:10.1016/j.mee.2009.11.054