Improved high-temperature etch processing of high-κ metal gate stacks in scaled TANOS memory devices

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Bibliographic Details
Main Authors: PAUL, J, BEYER, V, KNÖFLER, R, MIKOLAJICK, T, CZERNOHORSKY, M, BEUG, M. F, BIEDERMANN, K, MILDNER, M, MICHALOWSKI, P, SCHÜTZE, E, MELDE, T, WEGE, S
Format: Conference Proceeding
Language:English
Subjects:
Applied sciences
Cross-disciplinary physics: materials science
rheology
Electronics
Exact sciences and technology
Integrated circuits
Integrated circuits by function (including memories and processors)
Magnetic and optical mass memories
Materials science
Microelectronic fabrication (materials and surfaces technology)
Physics
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Storage and reproduction of information
Surface treatments
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ISSN:0167-9317
1873-5568