Comparison of modifications induced by ArF excimer laser irradiation on silicon nitride films deposited by different LCVD methods

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Bibliographic Details
Main Authors: BANERJI, N, SERRA, J, SERRA, C, CHIUSSI, S, LUSQUINOS, F, REDONDAS, X, LEON, B, PEREZ-AMOR, M
Format: Conference Proceeding
Language:English
Subjects:
Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Physics
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ISSN:0257-8972
1879-3347