Effect of Post-Deposition Processing on ZnO Thin Films and Devices: Group III Nitrides, Silicon Carbide, and Zinc Oxide

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Bibliographic Details
Published in:Journal of electronic materials 2010, Vol.39 (5), p.568-572
Main Authors: TINGFANG YEN, HAUNGS, Alan, SUNG JIN, CARTWRIGHT, Alexander, ANDERSON, Wayne A
Format: Article
Language:English
Subjects:
Condensed matter: electronic structure, electrical, magnetic, and optical properties
Condensed matter: structure, mechanical and thermal properties
Cross-disciplinary physics: materials science
rheology
Defects and impurities in crystals
microstructure
Deposition by sputtering
Doping and impurity implantation in other materials
Electrical properties of specific thin films
Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures
Electronic transport phenomena in thin films and low-dimensional structures
Exact sciences and technology
Galvanomagnetic and other magnetotransport effects (including thermomagnetic effects)
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Physics
Structure of solids and liquids
crystallography
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ISSN:0361-5235
1543-186X