Loading…
Analysis of Leakage Current Mechanisms in BiFeO3 Thin Films
Phonon-assisted tunneling (PhAT) model is applied for explication of temperature-dependent I-V characteristics measured by other investigators for BiFeO 3 films. Our proposed model describes well not only current dependence on temperature measured in a wide temperature range but also temperature-dep...
Saved in:
Published in: | Ferroelectrics 2010-01, Vol.396 (1), p.60-66 |
---|---|
Main Authors: | , , |
Format: | Article |
Language: | English |
Subjects: | |
Online Access: | Get full text |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
cited_by | |
---|---|
cites | |
container_end_page | 66 |
container_issue | 1 |
container_start_page | 60 |
container_title | Ferroelectrics |
container_volume | 396 |
creator | Pipinys, P. Rimeika, A. Lapeika, V. |
description | Phonon-assisted tunneling (PhAT) model is applied for explication of temperature-dependent I-V characteristics measured by other investigators for BiFeO
3
films. Our proposed model describes well not only current dependence on temperature measured in a wide temperature range but also temperature-dependent I-V data using the same set of parameters characterizing material under investigation. The values of active phonons energy and field strength for tunneling are estimated from the fit of current dependence on temperature and I-V-T data with the two different phonon-assisted tunnelling theories. |
doi_str_mv | 10.1080/00150191003795270 |
format | article |
fullrecord | <record><control><sourceid>proquest_pasca</sourceid><recordid>TN_cdi_pascalfrancis_primary_23217937</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>753654736</sourcerecordid><originalsourceid>FETCH-LOGICAL-i318t-7d4bf01604567886440ac36ac82967bcbb33a51146acc0d906fda57bb45586143</originalsourceid><addsrcrecordid>eNqFkDtPwzAQgC0EEqXwA9iyIKaAnfMjESylooBU1KXM0cV1qMFJip0K-u9x1TJ1YLrX951OR8glozeM5vSWUiYoKxiloAqRKXpEBkxISAVj2TEZbOdpBOCUnIXwEUvgvBiQu1GLbhNsSLo6mRr8xHeTjNfem7ZPXo1eYmtDExLbJg92YmaQzJcxn1jXhHNyUqML5mIfh-Rt8jgfP6fT2dPLeDRNLbC8T9WCVzVlknIhVZ5LzilqkKjzrJCq0lUFgPFMHluaLgoq6wUKVVVciFwyDkNyvdu78t3X2oS-bGzQxjlsTbcOpRIgBVcgI3m1JzFodLXHVttQrrxt0G_KDDKmClCRu99xtq073-B3592i7HHjOv8nAaPl9rXlwWujrv7VD6yy_-nhF36Ae1k</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>753654736</pqid></control><display><type>article</type><title>Analysis of Leakage Current Mechanisms in BiFeO3 Thin Films</title><source>Taylor and Francis:Jisc Collections:Taylor and Francis Read and Publish Agreement 2024-2025:Science and Technology Collection (Reading list)</source><creator>Pipinys, P. ; Rimeika, A. ; Lapeika, V.</creator><creatorcontrib>Pipinys, P. ; Rimeika, A. ; Lapeika, V.</creatorcontrib><description>Phonon-assisted tunneling (PhAT) model is applied for explication of temperature-dependent I-V characteristics measured by other investigators for BiFeO
3
films. Our proposed model describes well not only current dependence on temperature measured in a wide temperature range but also temperature-dependent I-V data using the same set of parameters characterizing material under investigation. The values of active phonons energy and field strength for tunneling are estimated from the fit of current dependence on temperature and I-V-T data with the two different phonon-assisted tunnelling theories.</description><identifier>ISSN: 0015-0193</identifier><identifier>EISSN: 1563-5112</identifier><identifier>DOI: 10.1080/00150191003795270</identifier><identifier>CODEN: FEROA8</identifier><language>eng</language><publisher>Colchester: Taylor & Francis Group</publisher><subject>63.20.kd ; 73.43.Jn ; 73.50.Fq ; 77.55.fp ; Condensed matter: electronic structure, electrical, magnetic, and optical properties ; Dielectric thin films ; Dielectrics, piezoelectrics, and ferroelectrics and their properties ; Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures ; Electronic transport in interface structures ; Exact sciences and technology ; Ferroelectric materials ; Ferroelectrics ; Field strength ; I-V characteristics ; Leakage current ; Mathematical models ; phonon-assisted tunneling ; Phonons ; Physics ; Thin films ; Tunneling ; Tunnelling</subject><ispartof>Ferroelectrics, 2010-01, Vol.396 (1), p.60-66</ispartof><rights>Copyright Taylor & Francis Group, LLC 2010</rights><rights>2015 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,4024,27923,27924,27925</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=23217937$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Pipinys, P.</creatorcontrib><creatorcontrib>Rimeika, A.</creatorcontrib><creatorcontrib>Lapeika, V.</creatorcontrib><title>Analysis of Leakage Current Mechanisms in BiFeO3 Thin Films</title><title>Ferroelectrics</title><description>Phonon-assisted tunneling (PhAT) model is applied for explication of temperature-dependent I-V characteristics measured by other investigators for BiFeO
3
films. Our proposed model describes well not only current dependence on temperature measured in a wide temperature range but also temperature-dependent I-V data using the same set of parameters characterizing material under investigation. The values of active phonons energy and field strength for tunneling are estimated from the fit of current dependence on temperature and I-V-T data with the two different phonon-assisted tunnelling theories.</description><subject>63.20.kd</subject><subject>73.43.Jn</subject><subject>73.50.Fq</subject><subject>77.55.fp</subject><subject>Condensed matter: electronic structure, electrical, magnetic, and optical properties</subject><subject>Dielectric thin films</subject><subject>Dielectrics, piezoelectrics, and ferroelectrics and their properties</subject><subject>Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures</subject><subject>Electronic transport in interface structures</subject><subject>Exact sciences and technology</subject><subject>Ferroelectric materials</subject><subject>Ferroelectrics</subject><subject>Field strength</subject><subject>I-V characteristics</subject><subject>Leakage current</subject><subject>Mathematical models</subject><subject>phonon-assisted tunneling</subject><subject>Phonons</subject><subject>Physics</subject><subject>Thin films</subject><subject>Tunneling</subject><subject>Tunnelling</subject><issn>0015-0193</issn><issn>1563-5112</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2010</creationdate><recordtype>article</recordtype><recordid>eNqFkDtPwzAQgC0EEqXwA9iyIKaAnfMjESylooBU1KXM0cV1qMFJip0K-u9x1TJ1YLrX951OR8glozeM5vSWUiYoKxiloAqRKXpEBkxISAVj2TEZbOdpBOCUnIXwEUvgvBiQu1GLbhNsSLo6mRr8xHeTjNfem7ZPXo1eYmtDExLbJg92YmaQzJcxn1jXhHNyUqML5mIfh-Rt8jgfP6fT2dPLeDRNLbC8T9WCVzVlknIhVZ5LzilqkKjzrJCq0lUFgPFMHluaLgoq6wUKVVVciFwyDkNyvdu78t3X2oS-bGzQxjlsTbcOpRIgBVcgI3m1JzFodLXHVttQrrxt0G_KDDKmClCRu99xtq073-B3592i7HHjOv8nAaPl9rXlwWujrv7VD6yy_-nhF36Ae1k</recordid><startdate>20100101</startdate><enddate>20100101</enddate><creator>Pipinys, P.</creator><creator>Rimeika, A.</creator><creator>Lapeika, V.</creator><general>Taylor & Francis Group</general><general>Taylor & Francis</general><scope>IQODW</scope><scope>7QQ</scope><scope>7SP</scope><scope>7U5</scope><scope>8FD</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>20100101</creationdate><title>Analysis of Leakage Current Mechanisms in BiFeO3 Thin Films</title><author>Pipinys, P. ; Rimeika, A. ; Lapeika, V.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-i318t-7d4bf01604567886440ac36ac82967bcbb33a51146acc0d906fda57bb45586143</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2010</creationdate><topic>63.20.kd</topic><topic>73.43.Jn</topic><topic>73.50.Fq</topic><topic>77.55.fp</topic><topic>Condensed matter: electronic structure, electrical, magnetic, and optical properties</topic><topic>Dielectric thin films</topic><topic>Dielectrics, piezoelectrics, and ferroelectrics and their properties</topic><topic>Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures</topic><topic>Electronic transport in interface structures</topic><topic>Exact sciences and technology</topic><topic>Ferroelectric materials</topic><topic>Ferroelectrics</topic><topic>Field strength</topic><topic>I-V characteristics</topic><topic>Leakage current</topic><topic>Mathematical models</topic><topic>phonon-assisted tunneling</topic><topic>Phonons</topic><topic>Physics</topic><topic>Thin films</topic><topic>Tunneling</topic><topic>Tunnelling</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Pipinys, P.</creatorcontrib><creatorcontrib>Rimeika, A.</creatorcontrib><creatorcontrib>Lapeika, V.</creatorcontrib><collection>Pascal-Francis</collection><collection>Ceramic Abstracts</collection><collection>Electronics & Communications Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Ferroelectrics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Pipinys, P.</au><au>Rimeika, A.</au><au>Lapeika, V.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Analysis of Leakage Current Mechanisms in BiFeO3 Thin Films</atitle><jtitle>Ferroelectrics</jtitle><date>2010-01-01</date><risdate>2010</risdate><volume>396</volume><issue>1</issue><spage>60</spage><epage>66</epage><pages>60-66</pages><issn>0015-0193</issn><eissn>1563-5112</eissn><coden>FEROA8</coden><abstract>Phonon-assisted tunneling (PhAT) model is applied for explication of temperature-dependent I-V characteristics measured by other investigators for BiFeO
3
films. Our proposed model describes well not only current dependence on temperature measured in a wide temperature range but also temperature-dependent I-V data using the same set of parameters characterizing material under investigation. The values of active phonons energy and field strength for tunneling are estimated from the fit of current dependence on temperature and I-V-T data with the two different phonon-assisted tunnelling theories.</abstract><cop>Colchester</cop><pub>Taylor & Francis Group</pub><doi>10.1080/00150191003795270</doi><tpages>7</tpages></addata></record> |
fulltext | fulltext |
identifier | ISSN: 0015-0193 |
ispartof | Ferroelectrics, 2010-01, Vol.396 (1), p.60-66 |
issn | 0015-0193 1563-5112 |
language | eng |
recordid | cdi_pascalfrancis_primary_23217937 |
source | Taylor and Francis:Jisc Collections:Taylor and Francis Read and Publish Agreement 2024-2025:Science and Technology Collection (Reading list) |
subjects | 63.20.kd 73.43.Jn 73.50.Fq 77.55.fp Condensed matter: electronic structure, electrical, magnetic, and optical properties Dielectric thin films Dielectrics, piezoelectrics, and ferroelectrics and their properties Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures Electronic transport in interface structures Exact sciences and technology Ferroelectric materials Ferroelectrics Field strength I-V characteristics Leakage current Mathematical models phonon-assisted tunneling Phonons Physics Thin films Tunneling Tunnelling |
title | Analysis of Leakage Current Mechanisms in BiFeO3 Thin Films |
url | http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-29T03%3A10%3A55IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_pasca&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Analysis%20of%20Leakage%20Current%20Mechanisms%20in%20BiFeO3%20Thin%20Films&rft.jtitle=Ferroelectrics&rft.au=Pipinys,%20P.&rft.date=2010-01-01&rft.volume=396&rft.issue=1&rft.spage=60&rft.epage=66&rft.pages=60-66&rft.issn=0015-0193&rft.eissn=1563-5112&rft.coden=FEROA8&rft_id=info:doi/10.1080/00150191003795270&rft_dat=%3Cproquest_pasca%3E753654736%3C/proquest_pasca%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-i318t-7d4bf01604567886440ac36ac82967bcbb33a51146acc0d906fda57bb45586143%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_pqid=753654736&rft_id=info:pmid/&rfr_iscdi=true |