An Ultrathin Forming-Free HfOx Resistance Memory With Excellent Electrical Performance

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Bibliographic Details
Published in:IEEE electron device letters 2010-12, Vol.31 (12), p.1473-1475
Main Authors: CHEN, Yu-Sheng, LEE, Heng-Yuan, CHEN, Pang-Shiu, WU, Tai-Yuan, WANG, Ching-Chiun, TZENG, Pei-Jer, CHEN, Frederick, TSAI, Ming-Jinn, LIEN, Chenhsin
Format: Article
Language:English
Subjects:
Applied sciences
Electronics
Exact sciences and technology
Magnetic and optical mass memories
Storage and reproduction of information
Online Access:Get full text
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ISSN:0741-3106
1558-0563
DOI:10.1109/LED.2010.2081658