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Electrical evaluation of Cu contamination behavior at the backside surface of a thinned wafer by transient capacitance measurement

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Bibliographic Details
Published in:Semiconductor science and technology 2011-02, Vol.26 (2), p.025007
Main Authors: Lee, K-W, Bea, J-C, Fukushima, T, Tanaka, T, Koyanagi, M
Format: Article
Language:English
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ISSN:0268-1242
1361-6641
DOI:10.1088/0268-1242/26/2/025007