Double Si nanocrystal layers grown by RPCVD for non-volatile memory applications

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Bibliographic Details
Published in:Semiconductor science and technology 2011-02, Vol.26 (2), p.025008
Main Authors: Masarotto, L, Molas, G, Jalaguier, E, Gay, G, Colonna, J P, Hartmann, J M, Yckache, K
Format: Article
Language:English
Subjects:
Applied sciences
Design. Technologies. Operation analysis. Testing
Electronics
Exact sciences and technology
Integrated circuits
Integrated circuits by function (including memories and processors)
Magnetic and optical mass memories
Microelectronic fabrication (materials and surfaces technology)
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Storage and reproduction of information
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ISSN:0268-1242
1361-6641
DOI:10.1088/0268-1242/26/2/025008