Selective area growth of GaN/AlN heterostructures

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Bibliographic Details
Main Authors: MARX, D, KAWAZU, Z, NAKAYAMA, T, MIHASHI, Y, TAKAMI, T, NUNOSHITA, M, OZEKI, T
Format: Conference Proceeding
Language:English
Subjects:
Applied sciences
Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
Cross-disciplinary physics: materials science
rheology
Electronics
Exact sciences and technology
Lithography, masks and pattern transfer
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Microelectronic fabrication (materials and surfaces technology)
Physics
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Online Access:Get full text
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ISSN:0022-0248
1873-5002