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Process Technology Variation : CHARACTERIZATION OF NANO CMOS VARIABIALITY BY SIMULATION AND MEASUREMENTS

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Bibliographic Details
Published in:IEEE transactions on electron devices 2011, Vol.58 (8), p.2197-2208
Main Authors: KUHN, Kelin J, GILES, Martin D, BECHER, David, KOLAR, Pramod, KORNFELD, Avner, KOTLYAR, Roza, MA, Sean T, MAHESHWARI, Atul, MUDANAI, Sivakumar
Format: Article
Language:English
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ISSN:0018-9383
1557-9646