Point defect evolution in low-temperature MOCVD growth of InN : Indium Nitride and Related Alloys

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Bibliographic Details
Published in:Physica status solidi. A, Applications and materials science Applications and materials science, 2012, Vol.209 (1), p.87-90
Main Authors: RAUCH, Christian, TUNA, Ocal, GIESEN, Christoph, HEUKEN, Michael, TUOMISTO, Filip
Format: Article
Language:English
Subjects:
Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
Condensed matter: electronic structure, electrical, magnetic, and optical properties
Condensed matter: structure, mechanical and thermal properties
Cross-disciplinary physics: materials science
rheology
Defects and impurities: doping, implantation, distribution, concentration, etc
Exact sciences and technology
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation
Other interactions of matter with particles and radiation
Physics
Positron annihilation
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
Thin film structure and morphology
Online Access:Get full text
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ISSN:1862-6300
1862-6319