SiO2/c-Si bilayer electron-beam resist process for nano-fabrication

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Bibliographic Details
Published in:Japanese journal of applied physics 1996, Vol.35 (12B), p.6673-6678
Main Authors: GORWADKAR, S. M, WADA, T, HARAICHI, S, HIROSHIMA, H, ISHI, K, KOMURO, M
Format: Article
Language:English
Subjects:
Applied sciences
Electronics
Exact sciences and technology
Microelectronic fabrication (materials and surfaces technology)
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Online Access:Get full text
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ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.35.6673