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Influence of the sputtering reactive gas on the oxide and oxynitride La—Ti—O—N deposition by RF magnetron sputtering

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Bibliographic Details
Published in:Applied surface science 2013, Vol.264, p.533-537
Main Authors: LU, Y, LE PAVEN-THIVET, C, BENZERGA, R, LE GENDRE, L, SHARAIHA, A, TESSIER, F, CHEVIRE, F
Format: Article
Language:English
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ISSN:0169-4332
1873-5584
DOI:10.1016/j.apsusc.2012.10.059