Negative photoresists for optical lithography : Optical lithography

Saved in:
Bibliographic Details
Published in:IBM journal of research and development 1997, Vol.41 (1-2), p.81-94
Main Authors: SHAW, J. M, GELORME, J. D, LABIANCA, N. C, CONLEY, W. E, HOLMES, S. J
Format: Article
Language:English
Subjects:
Applied sciences
Electronics
Exact sciences and technology
Microelectronic fabrication (materials and surfaces technology)
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:
ISSN:0018-8646
2151-8556