Multiple frequency capacitively coupled plasmas as a new technology for sputter processes: Pulsed high-power plasmas for deposition of nanostructured thin films

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Bibliographic Details
Published in:Journal of physics. D, Applied physics Applied physics, 2013, Vol.46 (8)
Main Authors: BIENHOLZ, S, BIBINOV, N, AWAKOWICZ, P
Format: Article
Language:English
Subjects:
Exact sciences and technology
Optical (ultraviolet, visible, infrared) measurements
Physics
Physics of gases, plasmas and electric discharges
Physics of plasmas and electric discharges
Plasma applications
Plasma diagnostic techniques and instrumentation
Plasma properties
Plasma-based ion implantation and deposition
Transport properties
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ISSN:0022-3727