SPR properties of 2D ZnO nano-holes fabricated by laser interference lithography

• Published in: Electronics letters 2013-04, Vol.49 (8), p.551-552
• Main Authors: Kim, S.H, Kim, D.G, Lee, B.H, Kim, T.U, Ki, H.C, Kim, H.J, Choi, Y.W, Lee, B.-T
• Format: Article
• Language: English
• Subjects: 2D nanoholes; Au thin‐film; Collective excitations (including excitons, polarons, plasmons and other charge-density excitations); Condensed matter: electronic structure, electrical, magnetic, and optical properties; Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures; etching; Exact sciences and technology; figure of merit; finite difference time‐domain analysis; grating structure; II‐VI semiconductors; laser interference lithography; laser materials processing; nanofabrication; nanolithography; nanostructured materials; Nanotechnology; Physics; semiconductor growth; size 50 nm; SPR properties; Surface and interface electron states; surface plasmon resonance; three‐dimensionanl finite‐difference time‐domain method; wet etching; wide band gap semiconductors; zinc compounds; ZnO
• ISSN: 0013-5194; 1350-911X; 1350-911X
• DOI: 10.1049/el.2013.0574

ZnO nanostructures are proposed to enhance the performance of surface plasmon resonance (SPR). The ZnO nanostructures on a 50 nm-thick Au thin-film are composed of nano-holes with a period of 300 nm. The ZnO nano-holes coupled SPR was simulated using the three-dimensionanl finite-difference time-domain method. The ZnO nano-holes have been fabricated by a laser interference lithography and wet etching process. The measured resonance angle of 47.5° was obtained; this agreed well with the simulated result. In comparison with the author's previous report, the figure of merit of ZnO nano-holes coupled SPR was two times higher than that of the ZnO grating structure.