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A Survey of Yield Modeling and Yield Enhancement Methods

Fast yield learning is critical to bringing products to the market in a timely fashion and is strongly linked to product revenues. This paper reviews methods to enable efficient yield learning, focusing on methods to quantify the most significant yield detractors and on in-line excursion detection m...

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Published in:IEEE transactions on semiconductor manufacturing 2013-05, Vol.26 (2), p.196-213
Main Author: Milor, L.
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Language:English
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cited_by cdi_FETCH-LOGICAL-c293t-f8200184091e176543bec8b865ada55d8d0fb1fbb24fb9afa2c396e349df70833
cites cdi_FETCH-LOGICAL-c293t-f8200184091e176543bec8b865ada55d8d0fb1fbb24fb9afa2c396e349df70833
container_end_page 213
container_issue 2
container_start_page 196
container_title IEEE transactions on semiconductor manufacturing
container_volume 26
creator Milor, L.
description Fast yield learning is critical to bringing products to the market in a timely fashion and is strongly linked to product revenues. This paper reviews methods to enable efficient yield learning, focusing on methods to quantify the most significant yield detractors and on in-line excursion detection methodologies.
doi_str_mv 10.1109/TSM.2013.2243766
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fullrecord <record><control><sourceid>pascalfrancis_ieee_</sourceid><recordid>TN_cdi_pascalfrancis_primary_27400958</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>6423953</ieee_id><sourcerecordid>27400958</sourcerecordid><originalsourceid>FETCH-LOGICAL-c293t-f8200184091e176543bec8b865ada55d8d0fb1fbb24fb9afa2c396e349df70833</originalsourceid><addsrcrecordid>eNo9j01Lw0AQhhdRMFbvgpdcPCbOfmb3WEqtQoOH1oOnsMnO2kialGwU-u9NSelpYOZ9ZuYh5JFCSimYl-0mTxlQnjImeKbUFYmolDphXMhrEoE2IlESsltyF8IPABXCZBHR83jz2__hMe58_FVj4-K8c9jU7XdsW3duLdudbSvcYzvEOQ67zoV7cuNtE_DhXGfk83W5Xbwl64_V-2K-Tipm-JB4zcZbWoChSDMlBS-x0qVW0jorpdMOfEl9WTLhS2O9ZRU3CrkwzmegOZ8RmPZWfRdCj7449PXe9seCQnEyL0bz4mRenM1H5HlCDjZUtvH9-HsdLhzLBICResw9TbkaES9jJRg3kvN_AaNgbw</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>A Survey of Yield Modeling and Yield Enhancement Methods</title><source>IEEE Electronic Library (IEL) Journals</source><creator>Milor, L.</creator><creatorcontrib>Milor, L.</creatorcontrib><description>Fast yield learning is critical to bringing products to the market in a timely fashion and is strongly linked to product revenues. This paper reviews methods to enable efficient yield learning, focusing on methods to quantify the most significant yield detractors and on in-line excursion detection methodologies.</description><identifier>ISSN: 0894-6507</identifier><identifier>EISSN: 1558-2345</identifier><identifier>DOI: 10.1109/TSM.2013.2243766</identifier><identifier>CODEN: ITSMED</identifier><language>eng</language><publisher>New York, NY: IEEE</publisher><subject>Applied sciences ; Data models ; Exact sciences and technology ; Excursion detection ; Firm modelling ; Mathematical model ; Operational research and scientific management ; Operational research. Management science ; Probes ; Production ; random yield ; Semiconductor device modeling ; systematic yield ; Systematics ; Throughput ; yield ; yield enhancement ; yield modeling</subject><ispartof>IEEE transactions on semiconductor manufacturing, 2013-05, Vol.26 (2), p.196-213</ispartof><rights>2014 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c293t-f8200184091e176543bec8b865ada55d8d0fb1fbb24fb9afa2c396e349df70833</citedby><cites>FETCH-LOGICAL-c293t-f8200184091e176543bec8b865ada55d8d0fb1fbb24fb9afa2c396e349df70833</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/6423953$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>314,780,784,27924,27925,54796</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&amp;idt=27400958$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Milor, L.</creatorcontrib><title>A Survey of Yield Modeling and Yield Enhancement Methods</title><title>IEEE transactions on semiconductor manufacturing</title><addtitle>TSM</addtitle><description>Fast yield learning is critical to bringing products to the market in a timely fashion and is strongly linked to product revenues. This paper reviews methods to enable efficient yield learning, focusing on methods to quantify the most significant yield detractors and on in-line excursion detection methodologies.</description><subject>Applied sciences</subject><subject>Data models</subject><subject>Exact sciences and technology</subject><subject>Excursion detection</subject><subject>Firm modelling</subject><subject>Mathematical model</subject><subject>Operational research and scientific management</subject><subject>Operational research. Management science</subject><subject>Probes</subject><subject>Production</subject><subject>random yield</subject><subject>Semiconductor device modeling</subject><subject>systematic yield</subject><subject>Systematics</subject><subject>Throughput</subject><subject>yield</subject><subject>yield enhancement</subject><subject>yield modeling</subject><issn>0894-6507</issn><issn>1558-2345</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2013</creationdate><recordtype>article</recordtype><recordid>eNo9j01Lw0AQhhdRMFbvgpdcPCbOfmb3WEqtQoOH1oOnsMnO2kialGwU-u9NSelpYOZ9ZuYh5JFCSimYl-0mTxlQnjImeKbUFYmolDphXMhrEoE2IlESsltyF8IPABXCZBHR83jz2__hMe58_FVj4-K8c9jU7XdsW3duLdudbSvcYzvEOQ67zoV7cuNtE_DhXGfk83W5Xbwl64_V-2K-Tipm-JB4zcZbWoChSDMlBS-x0qVW0jorpdMOfEl9WTLhS2O9ZRU3CrkwzmegOZ8RmPZWfRdCj7449PXe9seCQnEyL0bz4mRenM1H5HlCDjZUtvH9-HsdLhzLBICResw9TbkaES9jJRg3kvN_AaNgbw</recordid><startdate>20130501</startdate><enddate>20130501</enddate><creator>Milor, L.</creator><general>IEEE</general><general>Institute of Electrical and Electronics Engineers</general><scope>97E</scope><scope>RIA</scope><scope>RIE</scope><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>20130501</creationdate><title>A Survey of Yield Modeling and Yield Enhancement Methods</title><author>Milor, L.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c293t-f8200184091e176543bec8b865ada55d8d0fb1fbb24fb9afa2c396e349df70833</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2013</creationdate><topic>Applied sciences</topic><topic>Data models</topic><topic>Exact sciences and technology</topic><topic>Excursion detection</topic><topic>Firm modelling</topic><topic>Mathematical model</topic><topic>Operational research and scientific management</topic><topic>Operational research. Management science</topic><topic>Probes</topic><topic>Production</topic><topic>random yield</topic><topic>Semiconductor device modeling</topic><topic>systematic yield</topic><topic>Systematics</topic><topic>Throughput</topic><topic>yield</topic><topic>yield enhancement</topic><topic>yield modeling</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Milor, L.</creatorcontrib><collection>IEEE All-Society Periodicals Package (ASPP) 2005-present</collection><collection>IEEE All-Society Periodicals Package (ASPP) 1998-Present</collection><collection>IEEE Electronic Library Online</collection><collection>Pascal-Francis</collection><collection>CrossRef</collection><jtitle>IEEE transactions on semiconductor manufacturing</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Milor, L.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>A Survey of Yield Modeling and Yield Enhancement Methods</atitle><jtitle>IEEE transactions on semiconductor manufacturing</jtitle><stitle>TSM</stitle><date>2013-05-01</date><risdate>2013</risdate><volume>26</volume><issue>2</issue><spage>196</spage><epage>213</epage><pages>196-213</pages><issn>0894-6507</issn><eissn>1558-2345</eissn><coden>ITSMED</coden><abstract>Fast yield learning is critical to bringing products to the market in a timely fashion and is strongly linked to product revenues. This paper reviews methods to enable efficient yield learning, focusing on methods to quantify the most significant yield detractors and on in-line excursion detection methodologies.</abstract><cop>New York, NY</cop><pub>IEEE</pub><doi>10.1109/TSM.2013.2243766</doi><tpages>18</tpages></addata></record>
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identifier ISSN: 0894-6507
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1558-2345
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source IEEE Electronic Library (IEL) Journals
subjects Applied sciences
Data models
Exact sciences and technology
Excursion detection
Firm modelling
Mathematical model
Operational research and scientific management
Operational research. Management science
Probes
Production
random yield
Semiconductor device modeling
systematic yield
Systematics
Throughput
yield
yield enhancement
yield modeling
title A Survey of Yield Modeling and Yield Enhancement Methods
url http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-06T23%3A50%3A03IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-pascalfrancis_ieee_&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=A%20Survey%20of%20Yield%20Modeling%20and%20Yield%20Enhancement%20Methods&rft.jtitle=IEEE%20transactions%20on%20semiconductor%20manufacturing&rft.au=Milor,%20L.&rft.date=2013-05-01&rft.volume=26&rft.issue=2&rft.spage=196&rft.epage=213&rft.pages=196-213&rft.issn=0894-6507&rft.eissn=1558-2345&rft.coden=ITSMED&rft_id=info:doi/10.1109/TSM.2013.2243766&rft_dat=%3Cpascalfrancis_ieee_%3E27400958%3C/pascalfrancis_ieee_%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c293t-f8200184091e176543bec8b865ada55d8d0fb1fbb24fb9afa2c396e349df70833%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_id=info:pmid/&rft_ieee_id=6423953&rfr_iscdi=true