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Process stabilization and a significant enhancement of the deposition rate in reactive high-power impulse magnetron sputtering of ZrO2and Ta2O5 films
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Published in: | Surface & coatings technology 2013, Vol.236, p.550-556 |
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Main Authors: | , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Online Access: | Get full text |
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ISSN: | 0257-8972 1879-3347 |