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Process stabilization and a significant enhancement of the deposition rate in reactive high-power impulse magnetron sputtering of ZrO2and Ta2O5 films

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Bibliographic Details
Published in:Surface & coatings technology 2013, Vol.236, p.550-556
Main Authors: VLCEK, J, REZEK, J, HOUSKA, J, CERSTVY, R, BUGYI, R
Format: Article
Language:English
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ISSN:0257-8972
1879-3347