The effect of fluorine on the redistribution of boron in ion-implanted silicon

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Bibliographic Details
Published in:Journal of applied physics 1993, Vol.74 (10), p.6020-6022
Main Authors: KRASNOBAEV, L. YA, OMELYANOVSKAYA, N. M, MAKAROV, V. V
Format: Article
Language:Russian
Online Access:Get full text
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ISSN:0021-8979
1089-7550