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The surface of machined silicon wafers: Raman spectroscopic study

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Published in:	Semiconductor science and technology 1994-04, Vol.9 (4), p.404-408
Main Authors:	Verhey, J, Bismayer, U, Guttler, B, Lundt, H
Format:	Article
Language:	English
Subjects:	Applied sciences Condensed matter: electronic structure, electrical, magnetic, and optical properties Condensed matter: structure, mechanical and thermal properties Electronics Exact sciences and technology Infrared and raman spectra and scattering Lithography, masks and pattern transfer Microelectronic fabrication (materials and surfaces technology) Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation Other nonmetallic inorganics Physics Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Solid surfaces and solid-solid interfaces Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties)
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description
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identifier	ISSN: 0268-1242
ispartof	Semiconductor science and technology, 1994-04, Vol.9 (4), p.404-408
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source	Institute of Physics:Jisc Collections:IOP Publishing Journal Archive 1874-1998 (access period 2020 to 2024); Institute of Physics:Jisc Collections:IOP Publishing Read and Publish 2024-2025 (Reading List)
subjects	Applied sciences Condensed matter: electronic structure, electrical, magnetic, and optical properties Condensed matter: structure, mechanical and thermal properties Electronics Exact sciences and technology Infrared and raman spectra and scattering Lithography, masks and pattern transfer Microelectronic fabrication (materials and surfaces technology) Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation Other nonmetallic inorganics Physics Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Solid surfaces and solid-solid interfaces Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties)
title	The surface of machined silicon wafers: Raman spectroscopic study
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