Impedance analysis of plasma-enhanced chemical-vapour-deposited TiO2 film in O.1 M NaOH solution near the flat-band potential

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Bibliographic Details
Published in:Journal of alloys and compounds 1994, Vol.205, p.53-57
Main Authors: SU-IL PYUN, TAE-HYUN YANG, YOUNG-GI YOON
Format: Article
Language:English
Subjects:
Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Physics
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ISSN:0925-8388
1873-4669